Optical Lithography

PROCEEDINGS & JOURNAL ARTICLES

Proceedings Volume 9880 (Multispectral, Hyperspectral, and Ultraspectral Remote Sensing Technology, Techniques and Applications VI) >
April 30, 2016
Proc SPIE. 9880, Multispectral, Hyperspectral, and Ultraspectral Remote Sensing Technology, Techniques and Applications VI, 98800U (April 30, 2016);  doi:10.1117/12.2228151

Proceedings Volume 9892 (Semiconductor Lasers and Laser Dynamics VII) >
April 28, 2016
Proc SPIE. 9892, Semiconductor Lasers and Laser Dynamics VII, 98921R (April 28, 2016);  doi:10.1117/12.2227529

Proceedings Volume 9888 (Micro-Optics 2016) >
April 27, 2016
Proc SPIE. 9888, Micro-Optics 2016, 988805 (April 27, 2016);  doi:10.1117/12.2225917

Proceedings Volume 9888 (Micro-Optics 2016) >
April 27, 2016
Proc SPIE. 9888, Micro-Optics 2016, 988808 (April 27, 2016);  doi:10.1117/12.2227700

Journal of Micro/Nanolithography, MEMS, and MOEMS  |  Special Section on Control of Integrated Circuit Patterning Variance, Part 2: Image Placement, Device Overlay, and Critical Dimension
April 27, 2016
J. Micro/Nanolith. MEMS MOEMS. 15 (2), 021405 (April 27, 2016);  doi:10.1117/1.JMM.15.2.021405

Proceedings Volume 9776 (Extreme Ultraviolet (EUV) Lithography VII) >
April 26, 2016
Proc SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII, 97761P (April 26, 2016);  doi:10.1117/12.2220036

Proceedings Volume 9778 (Metrology, Inspection, and Process Control for Microlithography XXX) >
April 21, 2016
Proc SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX, 97780L (April 21, 2016);  doi:10.1117/12.2218983

Proceedings Volume 9802 (Nanosensors, Biosensors, and Info-Tech Sensors and Systems 2016) >
April 16, 2016
Proc SPIE. 9802, Nanosensors, Biosensors, and Info-Tech Sensors and Systems 2016, 98020K (April 16, 2016);  doi:10.1117/12.2218236

Journal of Micro/Nanolithography, MEMS, and MOEMS  |  Lithography
April 12, 2016
J. Micro/Nanolith. MEMS MOEMS. 15 (2), 023502 (April 12, 2016);  doi:10.1117/1.JMM.15.2.023502

Proceedings Volume 9776 (Extreme Ultraviolet (EUV) Lithography VII) >
April 11, 2016
Proc SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII, 977610 (April 11, 2016);  doi:10.1117/12.2220113

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