This PDF file contains the front matter associated with SPIE Proceedings Volume 12808, including the Title Page, BACUS Officer List, Symposium Director list, and Table of Contents.

I’d like to talk a little bit about what Intel is doing and what our environment is and relate that to how we view our mask supplier.

In this paper, I will report basic properties and process evaluation of commercially available electron beam resists in Japan. Furthermore, I will give an outline of the trends of reasearch and development of electron beam resists for mask making.

We have two different methods of making X-ray masks at this point. In the first method, we start out with a silicon wafer, we then deposit boranitrite in which there is some hydrogen, then we etch the boranitrite away from one side of the wafer; we leave a little bit on the other side, at the edges because the adhesion of that boranitrite to the pyrex ring in the next step is very good. We bond the silicon wafer (with the boranitrite on it) to a pyrex ring. On top of the boranitrite we deposit a layer of polyimide. The polyimide has two functions: 1. to planerize the surface because the boranitrite isn’t perfectly flat. It tends to have little hillocks and things in it. 2. increases the strength of the membrane.

Ultratech has been in the 1X stepper business for about three or four years now. A lot of you have probably either made the reticles or used them. Our lens design is quite unique. It's called a 'Wind Dyson' design. It's a five-element design. That's the entire lens.

High-energy (approximately 15 keV) ion beams have been successfully used to convert photoresist into a hard, well-adhered, optically-dense vitreous carbon film. The resulting material is an excellent hard mask fabrication or repair material which has scratch resistance and UV optical density comparable to that of chrome, and having chemical resistance and substrate adhesion superior to that of chrome. High-quality hard photomasks have been fabricated by ion-implanting resists directly on glass. Clear defects in standard chrome hard masks have been repaired by ion-bombarding reverse-tone positive photoresist patches. The resultant repairs are as durable as chrome and are indistinguishable from the chrome when printed with 405 or 460 nm light. Thin layers of electron-beam sensitive resists such COP and PBS have also been successfully hardened by ion-bombardment. To take advantage of this phenomenon a simple and low-cost ion accelerator has been designed for ion hardening of resist. This new accelerator makes the application of the techniques practical and cost-effective for photomask processing.

The Cambridge Chipcheck was accepted March 30, 1984 in our Santa Clara facility. The Chipcheck will compare a database with a chrome pattern on glass. This paper will describe the acceptance procedure and results in the following five months of work in putting the machine in production at National. The paper will discuss the following topics - monitoring the Chipcheck, integration of the machine into the work flow, general performance outline, the actual flow of a job through Chipcheck, and a general conclusion of our experiences.

Qualification of new materials and process optimization are on-going tasks in any successful production environment. One of the most efficient testing methods is the Factorial Design Experiment. Application of this method is useful for small screening tests to determine significance of variables. In many situations, this method is the most efficient means of data collection and analysis. Factorial designs go beyond the "one-at-a-time" tests by allowing comprehensive analysis of data where more than one variable has been changed at a time.

What are we doing at RIT about this educational system? Well, let me tell you a little something about the micro-electronics bachelor's degree program we have now. (It will soon be developing into a Master's Degree program but we have to graduate some people with bachelor's degrees first.) It's been in place three years and is a combination of Physics Department, Mathematics Department, the College of Science, the College of Graphic Arts and Photography, the College of Engineering. There is five year program which has the usual requirements of physics, chemistry, math, electrical engineering, material science, and photographic science. These people are busy, but they will have a very, very strong background by the time they get done.

Good afternoon! My paper today is on the subject of Novel Anti-reflective Coatings for Improved Critical Dimension Control. I will be speaking on the advantages and disadvantages or reflection control films, and the results of studies on critical dimension control as a function of chromium film thickness, uniformity, and reflectivity of mask blanks.

These mask inspection units you’ve been hearing about look a lot like a stepper in that there is an optical system, a laser stage, and a computer. It's what the computer does that makes a difference.

There are three areas to cover here: 1. Just what the idea of a central or universal data base is. 2. What sort of possibilities can come out of such a thing. 3. How do we get there from here?

This presentation, MA New LE Substrate", will concentrate on a low expensive substrate developed in conjunction with a new material we call EX30. In developing EX30, our goal was to end up with a material that would be a direct substitute for LE30. A material that could be intermixed, interchanged with LE30 in the production line. We believe we have achieved this goal. A few slides to show why.

This was a panel discussion that took place at Bay Area Chrome Users Society Symposium 1984.