Mask Design For Integrated Circuits - An Application For Computer Graphics

E. Baubock

doi:10.1117/12.955344

10 April 1977 Mask Design For Integrated Circuits - An Application For Computer Graphics

E. Baubock

Proceedings Volume 0099, 3rd European Electro-Optics Conf; (1977) https://doi.org/10.1117/12.955344
Event: Third European Electro-Optics Conference, 1976, Geneva, Switzerland

Abstract

With increasing of scale and complexity of integrated circuits the design of their mask layout becomes more and more difficult. For improving of economy and throughput time computer aids are required. Fully automated techniques have been developed and are successfully used for particular tasks but general application of algorithms is not within reach. In some IC technologies a wide range of electrical and physical constraints are to be taken into account. The experience of the designer is required. Presently known algorithms do not yield optimal solutions with respect to chip size, yet minimum chip size is a strong requirement in most cases. A partially automated way seems to be most suitable. The interactive graphical display is a qualified and powerful tool for the solution of this task. An automatically generated rough design can be detailed and finished on the screen. - The paper describes in particular the interactive part of an IC design system developed in Philips Research Lab. Special attention will be paid to several kinds of computer support during the design process. Examples are the online design rule checking facility providing minimum distances of objects, the flexible moving algorithm with rubberband like behaviour of the interconnection paths and the comparison of the layout with the given network. Interactive working will be considered as division of labour between man and computer.

Citation Download Citation

E. Baubock "Mask Design For Integrated Circuits - An Application For Computer Graphics", Proc. SPIE 0099, 3rd European Electro-Optics Conf, (10 April 1977); https://doi.org/10.1117/12.955344

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