Sensitive Materials For Image Instrumentation

Eiichi Mizuki

doi:10.1117/12.957544

27 July 1979 Sensitive Materials For Image Instrumentation

Eiichi Mizuki

Proceedings Volume 0189, 13th Intl Congress on High Speed Photography and Photonics; (1979) https://doi.org/10.1117/12.957544
Event: 13th International Congress on High Speed Photography and Photonics, 1978, Tokyo, Japan

Abstract

The following four materials or phenomena are described in this report. (1) In contrast to wet-developing photopolymer systems now widely used, a new dry-developable photopolymer pro-cess (peel-apart process) for production of printed circuits and printing plates are described. (2) A real-time, high-resolution laser recording dry film consisting of a transparent substrate, an evaporated thin-film, and a protective overcoat is described. (3) A photographic material consisting of a silver halide emulsion layer formed on a metal or metal oxide layer deposited on a transparent support, and processes therefor are described. (4) Certain silver halide materials intended for high intensity and short time exposure were developed, with physical measurements made on these materials being described.

Citation Download Citation

Eiichi Mizuki "Sensitive Materials For Image Instrumentation", Proc. SPIE 0189, 13th Intl Congress on High Speed Photography and Photonics, (27 July 1979); https://doi.org/10.1117/12.957544

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