Precision Laser Irradiation System

Eugene G. Arthurs; Kuo-Ching Liu

doi:10.1117/12.934962

9 August 1983 Precision Laser Irradiation System

Eugene G. Arthurs, Kuo-Ching Liu

Proceedings Volume 0385, Laser Processing of Semiconductor Devices; (1983) https://doi.org/10.1117/12.934962
Event: 1983 Los Angeles Technical Symposium, 1983, Los Angeles, United States

Abstract

Current and projected applications of laser micromachining in the semiconductor industry are discussed. A precision laser irradiation system designed for applications in the production of very large scale integrated circuits is described. The equipment incorporates a frequency doubled neodymium in YAG laser, high numerical aperture optics and a precision XY stage. The laser is engineered to produce short pulses reliably in order to simplify control of laser induced thermal effects. Several examples of application of the equipment are described.

Citation Download Citation

Eugene G. Arthurs and Kuo-Ching Liu "Precision Laser Irradiation System", Proc. SPIE 0385, Laser Processing of Semiconductor Devices, (9 August 1983); https://doi.org/10.1117/12.934962

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