Yield Detraction In Simple Photoengraving

A Marsh

doi:10.1117/12.935138

7 November 1983 Yield Detraction In Simple Photoengraving

A Marsh

Proceedings Volume 0394, Optical Microlithography II: Technology for the 1980s; (1983) https://doi.org/10.1117/12.935138
Event: 1983 Microlithography Conferences, 1983, Santa Clara, United States

Abstract

Simple test structures have been used to evaluate the yield capabilities of a photoengraving process. The structures consist of meander tracks placed between two interdigitating sets of fingers so that electrical tests reveal both the breaks in the track and any shorts between the track and the fingers. This paper illustrates some aspects of the yield obtained with a standard positive resist photoengraving process applied to single-layer metallisation and to polysilicon over a range of feature sizes. Simple mathematical models are employed to convert yield data into fault density data and to conveniently express the dependence on feature size. The models are applicable to both test structures and circuits.

Citation Download Citation

A Marsh "Yield Detraction In Simple Photoengraving", Proc. SPIE 0394, Optical Microlithography II: Technology for the 1980s, (7 November 1983); https://doi.org/10.1117/12.935138

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available