Paper
20 August 1986 Where Is The Lost Resolution?
Burn J. Lin
Author Affiliations +
Abstract
In addition to raising the numerical aperture of the imaging lens or reducing the exposing wavelength to improve resolution in optical lithography, a third direction is pursued, namely restoration of the potential resolution capability that is lost due to incorrect practice. Unlike the former two methods, a gain in depth of focus can accompany improvement in resolution. In this paper, elimination of vibration between the mask and the wafer, resist contrast improvement, and multilayer resist systems are cited as possible means for improvement. Simulation study are given on the effects of vibration and resist contrast improvement to quantitatively assess the improvements.
© (1986) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Burn J. Lin "Where Is The Lost Resolution?", Proc. SPIE 0633, Optical Microlithography V, (20 August 1986); https://doi.org/10.1117/12.963701
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CITATIONS
Cited by 23 scholarly publications.
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KEYWORDS
Optical lithography

Image resolution

Photomasks

Americium

Semiconducting wafers

Tolerancing

Diffraction

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