Angle Resolved X-ray Photoelectron Spectroscopy Applied to Patchy Surfaces

D. J. Pocker

doi:10.1117/12.936602

12 August 1986 Angle Resolved X-ray Photoelectron Spectroscopy Applied to Patchy Surfaces

D. J. Pocker

Proceedings Volume 0690, X-Rays in Materials Analysis: Novel Applications and Recent Developments; (1986) https://doi.org/10.1117/12.936602
Event: 30th Annual Technical Symposium, 1986, San Diego, United States

Abstract

This paper reviews the principles of X-ray photoelectron spectroscopy (XPS) critical to the interpretation of angle resolved measurements. A simple model appropriate for a heterogeneous overlayer on a flat surface is presented. An outline of the quantitative determination of overlayer characteristics is also included. The technique described is applied to the naturally occurring layers on an air exposed surface of a silicon wafer.

Citation Download Citation

D. J. Pocker "Angle Resolved X-ray Photoelectron Spectroscopy Applied to Patchy Surfaces", Proc. SPIE 0690, X-Rays in Materials Analysis: Novel Applications and Recent Developments, (12 August 1986); https://doi.org/10.1117/12.936602

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available