Automatic Linewidth Control System

Laura J. Uhler

doi:10.1117/12.940405

17 April 1987 Automatic Linewidth Control System

Laura J. Uhler

Proceedings Volume 0775, Integrated Circuit Metrology, Inspection, & Process Control; (1987) https://doi.org/10.1117/12.940405
Event: Microlithography Conferences, 1987, Santa Clara, CA, United States

Abstract

A system used to provide linewidth control in a IC manufacturing facility is described. It combines the use of interferometry, real time endpoint detection, and automation to tighten linewidth distributions by adjusting development times. The use of Fourier Transforms provide consistent endpoint detection for a variety of part, process, and substrate types. The system increases throughput and reduces rework by eliminating the need for trial wafers. It also provides a means for process monitoring as well as a tool for troubleshooting, and process development. The paper describes the Automatic Linewidth Control System: its operation, algorithms for endpoint detection and its performance.

Citation Download Citation

Laura J. Uhler "Automatic Linewidth Control System", Proc. SPIE 0775, Integrated Circuit Metrology, Inspection, & Process Control, (17 April 1987); https://doi.org/10.1117/12.940405

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available