X-Ray Lithography Using A KrF Laser-Produced Plasma

T. Tomie; K. Koyama; N. Atoda; S . Komeiji; Y Matsumoto; A. Yaoita; I. Matsushima; M. Yano

doi:10.1117/12.965041

4 February 1988 X-Ray Lithography Using A KrF Laser-Produced Plasma

T. Tomie, K. Koyama, N. Atoda, S . Komeiji, Y Matsumoto, A. Yaoita, I. Matsushima, M. Yano

Proceedings Volume 0831, X-Rays from Laser Plasmas; (1988) https://doi.org/10.1117/12.965041
Event: 31st Annual Technical Symposium on Optical and Optoelectronic Applied Sciences and Engineering, 1987, San Diego, CA, United States

Abstract

Experiments to demonstrate the feasibility of a small laser for x-ray lithography are discribed. Resist exposure experiment was performed by x-rays from a plasma produced by a KrF laser, 0.6 J/ 20 ns. With 50 shots exposure, a very fine pattern of 0.5 μm line & space was printed onto a resist EBR-9 at 3 cm from an iron plate target. The conditions for a laser-plasma to be a practical source for x-ray lithography are discussed.

Citation Download Citation

T. Tomie, K. Koyama, N. Atoda, S . Komeiji, Y Matsumoto, A. Yaoita, I. Matsushima, and M. Yano "X-Ray Lithography Using A KrF Laser-Produced Plasma", Proc. SPIE 0831, X-Rays from Laser Plasmas, (4 February 1988); https://doi.org/10.1117/12.965041

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