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The papers in this volume were part of the technical conference cited on the cover and title page. Papers were selected and subject to review by the editors and conference program committee. Some conference presentations may not be available for publication. Additional papers and presentation recordings may be available online in the SPIE Digital Library at SPIEDigitalLibrary.org. The papers reflect the work and thoughts of the authors and are published herein as submitted. The publisher is not responsible for the validity of the information or for any outcomes resulting from reliance thereon. Please use the following format to cite material from these proceedings: Author(s), “Title of Paper,” in 33rd European Mask and Lithography Conference, edited by Uwe F.W. Behringer, Jo Finders, Proceedings of SPIE Vol. 10446 (SPIE, Bellingham, WA, 2017) Seven-digit Article CID Number. ISSN: 0277-786X ISSN: 1996-756X (electronic) ISBN: 9781510613560 ISBN: 9781510613577 (electronic) Published by SPIE P.O. Box 10, Bellingham, Washington 98227-0010 USA Telephone +1 360 676 3290 (Pacific Time) · Fax +1 360 647 1445 Copyright © 2017, Society of Photo-Optical Instrumentation Engineers. Copying of material in this book for internal or personal use, or for the internal or personal use of specific clients, beyond the fair use provisions granted by the U.S. Copyright Law is authorized by SPIE subject to payment of copying fees. The Transactional Reporting Service base fee for this volume is $18.00 per article (or portion thereof), which should be paid directly to the Copyright Clearance Center (CCC), 222 Rosewood Drive, Danvers, MA 01923. Payment may also be made electronically through CCC Online at copyright.com. Other copying for republication, resale, advertising or promotion, or any form of systematic or multiple reproduction of any material in this book is prohibited except with permission in writing from the publisher. The CCC fee code is 0277-786X/17/$18.00. Printed in the United States of America. Publication of record for individual papers is online in the SPIE Digital Library. Paper Numbering: Proceedings of SPIE follow an e-First publication model. A unique citation identifier (CID) number is assigned to each article at the time of publication. Utilization of CIDs allows articles to be fully citable as soon as they are published online, and connects the same identifier to all online and print versions of the publication. SPIE uses a seven-digit CID article numbering system structured as follows:
AuthorsNumbers in the index correspond to the last two digits of the seven-digit citation identifier (CID) article numbering system used in Proceedings of SPIE. The first five digits reflect the volume number. Base 36 numbering is employed for the last two digits and indicates the order of articles within the volume. Numbers start with 00, 01, 02, 03, 04, 05, 06, 07, 08, 09, 0A, 0B…0Z, followed by 10-1Z, 20-2Z, etc. Adam, Kostas, 0V Arat, Kerim T., 0G Ausserhuber, H., 0Z Bahrig, L., 0T Besacier, Maxime, 0L Bilski, Bartosz, 05 Bolten, Jens, 0G Borisov, Michael V., 0X Bork, Ingo, 0B Buck, Peter, 0B Burbine, Andrew, 0V Buttgereit, Ute, 0V Caspary, D., 0T Chaudhary, Narendra, 0C Chelyubeev, Dmitry A., 0X Chen, Ao, 0V Chernik, Vitaly V., 0X Chidambaram, N., 13 Chung, Angeline, 0V Clifford, Chris, 0V Constantoudis, Vassilios, 0K Dawson, Guy, 08 De Bisschop, Peter, 0V Ducoté, Julien, 0L Egodage, Kokila, 0I Ehrlich, Christian, 0I Ekinci, Yasin, 08 Englard, Ilan, 0U Erben, Jens W., 0J Farys, Vincent, 0L Faury, T., 0Z Fechtig, D., 0Z Feicke, A., 0T Fliervoet, Timon, 05 Foong, Yee Mei, 0V Fuchsbauer, A., 0Z Garetto, Anthony, 0I Giollo, Manuel, 0O Gkorou, Dimitra, 0O Haslinger, M. J., 0Z Helke, Christian, 0J Hiller, Karla, 0J Hoekstra, R., 13 Hooker, Kevin, 04 Ikeda, M., 0Z Jähne, S., 0T Kaiser, M., 0T Kamikubo, Takashi, xvii Kastner, J., 0Z Kazarian, Aram, 04 Kazazis, Dimitrios, 08 Kirchner, R., 13 Kleinjans, Herberth, 0J Koepplmayr, T., 0Z Koster, Norbert, 03 Kristlib, M., 0T Kuechler, Bernd, 04 Kulse, P., 0P Kurth, Steffen, 0J Kurzmann, J., 0Z Lakcher, Amine, 0L Lam, Auguste, 0O Laubis, Christian, 09 Le-Gratiet, Bertrand, 0L Lemme, Max C., 0G Liu, Xing Lan, 0O Lorbeer, J., 0T Lucas, Kevin, 04 Luong, Kim Vu, 09 Lutich, Andrey, 0M, 10 Malik, Nitin Singh, 0U Matsumoto, Hiroshi, 07 McClelland, Alexandra, 08 McNamara, John, 05 Meinig, Marco, 0J Miheev, Peter A., 0X Miura, Satoru, xvii Mohtashami, Abbas, 0U Muehlberger, M., 0Z Nakayamada, Noriaki, xvii Navarro, Violeta, 0U Nesladek, P., 0T Nishimura, Rieko, xvii Nomura, Haruyuki, xvii Nowak, Christoph, 0J Ohtoshi, Kenji, 07 Oorschot, Dorothe, 05 Otto, Thomas, 0J Papavieros, George, 0K Philipsen, Vicky, 09 Popescu, Carmen, 08 Porschatis, Caroline, 0G Rakhovskii, Vadim I., 0X Reuter, Danny, 0J Robinson, Alex P. G., 08 Roth, John, 08 Sadeghian, Hamed, 0U Sasai, K., 0P Savari, Serap A., 0C Schatz, Jirka, 0M, 10 Schift, H., 13 Schneider, Loïc, 0L Scholze, Frank, 09 Schulz, K., 0P Schulz, Kristian, 0I Shamaev, Alexei S., 0X Shemesh, Dror, 0U Staring, Wilbert, 03 Sturtevant, John, 0V Tabbone, Gilles, 0I Tamura, Takao, 07 te Sligte, Edwin, 03 Thaler, Thomas, 0V Theis, Wolfgang, 08 Ünal, Nezih, 0G Utzny, Clemens, 0N van de Kerkhof, Mark, 05 van Haren, Richard, 0O Verberk, Rogier, 03 Wahlbrink, Thorsten, 0G Wandel, T., 0T Wang, Ziyang, 05 Weisbuch, François, 0M, 10 Wietstruck, M., 0P Wittebrood, Friso, 05 Woegerer, C., 0Z Xiao, Guangming, 04 Yamashita, Hiroshi, 07 Yoshida, Koichiro, 0D Conference CommitteeConference Chairs Conference Co-Chairs
Program Chairs
Program Co-Chairs
Other Members
Session Chairs
ForewordOn behalf of VDE/VDI-GMM, the EMLC2017 sponsors, and the EMLC2017 organizing and international program committees, we welcome you to the proceedings from the 33rd European Mask and Lithography Conference, EMLC2017, at the Hilton Hotel in Dresden, Germany. The conference has annually brought together scientists, researchers, engineers, and technologists from research institutes and companies from around the world to present innovations at the forefront of mask lithography and mask technology. The two and a half day conference is dedicated to the science, technology, engineering, and application of mask and lithography technologies and associated processes, giving an overview of the present status in mask and lithography technologies and the future strategy where mask producers and users have the opportunity of becoming acquainted with new developments and results. This year’s sessions included: Wafer Lithography (193i and EUV), Mask Patterning, Metrology, and Process, Non-IC Applications, Nano-Imprint Lithography, Mask2Wafer Metrology, and Using the Data / Big Data. Mathias Kamolz from Infineon Technologies (Germany) was the welcome speaker. He presented, “The Power of Power-Semiconductors.” Jim Wiley from ASML US, Inc. (United States) was the first keynote speaker. His talk was titled “The Status and Challenges of the EUV photomask ecosystem.” The second keynote speaker was Bryan Rice from Globalfoundries Dresden (Germany) who presented “Breaking the Paradigm: FDX Technology at Globalfoundries.” The third keynote speaker was Paul Ackmann from Globalfoundries Inc. (United States). The title of his presentation was “Integral Nature of Masks through five Decades.” We invited Kurt Ronse from IMEC (Belgium) who presented a talk titled “Recent EUV developments at IMEC.” As every year, the Best Paper and Best Poster from BACUS 2016 were presented, followed by the Best Paper from PMJ 2017. A total of 47 papers—3 keynotes, 9 invited, 20 orals and 15 posters—were presented. TutorialsFor the first time, the conference included two tutorials. Andreas Erdmann from Fraunhofer IISB (Germany) gave the first tutorial on “General introduction into lithographic imaging by projection optics.” The second tutorial, “Interaction of mask and scanner in EUV projection optics,” was presented by Jo Finders from ASML Netherlands B.V. Technical ExhibitionParallel to the conference presentations, a technical exhibition took place on Tuesday and Wednesday where companies (mask suppliers, material suppliers, and equipment suppliers) exhibited their companies and products. To foster the exchange between the conference attendees and the exhibitors, the exhibition area was also the place for all coffee and lunch breaks. We hope that you enjoyed the technical sessions of the EMLC2017 as well as the technical exhibition, but also allowed yourself to visit the beautiful city of Dresden. Uwe F.W. Behringer EMLC2017 Conference Chair |
