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28 September 2017 Parallel compression/decompression-based datapath architecture for multibeam mask writers
Narendra Chaudhary, Serap A. Savari
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Proceedings Volume 10446, 33rd European Mask and Lithography Conference; 104460C (2017) https://doi.org/10.1117/12.2279737
Event: 33rd European Mask and Lithography Conference, 2017, Dresden, Germany
Abstract
Multibeam electron beam systems will be used in the future for mask writing and for complimentary lithography. The major challenges of the multibeam systems are in meeting throughput requirements and in handling the large data volumes associated with writing grayscale data on the wafer. In terms of future communications and computational requirements Amdahl’s Law suggests that a simple increase of computation power and parallelism may not be a sustainable solution. We propose a parallel data compression algorithm to exploit the sparsity of mask data and a grayscale video-like representation of data. To improve the communication and computational efficiency of these systems at the write time we propose an alternate datapath architecture partly motivated by multibeam direct write lithography and partly motivated by the circuit testing literature, where parallel decompression reduces clock cycles. We explain a deflection plate architecture inspired by NuFlare Technology’s multibeam mask writing system and how our datapath architecture can be easily added to it to improve performance.
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Narendra Chaudhary and Serap A. Savari "Parallel compression/decompression-based datapath architecture for multibeam mask writers", Proc. SPIE 10446, 33rd European Mask and Lithography Conference, 104460C (28 September 2017); https://doi.org/10.1117/12.2279737
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KEYWORDS
Photomasks
Beam controllers
Data compression
Electron beam lithography
Electron beams
Lithography
Mask making
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