Sub-micron lines patterning into silica using water developable chitosan bioresist films for eco-friendly positive tone e-beam and UV lithography

Mathieu Caillau; Céline Chevalier; Pierre Crémillieu; Thierry Delair; Olivier Soppera; Benjamin Leuschel; Cédric Ray; Christophe Moulin; Christian Jonin; Emmanuel Benichou; Pierre-François Brevet; Christelle Yeromonahos; Emmanuelle Laurenceau; Yann Chevolot; Jean-Louis Leclercq

doi:10.1117/12.2292312

20 March 2018 Sub-micron lines patterning into silica using water developable chitosan bioresist films for eco-friendly positive tone e-beam and UV lithography

Mathieu Caillau, Céline Chevalier, Pierre Crémillieu, Thierry Delair, Olivier Soppera, Benjamin Leuschel, Cédric Ray, Christophe Moulin, Christian Jonin, Emmanuel Benichou, Pierre-François Brevet, Christelle Yeromonahos, Emmanuelle Laurenceau, Yann Chevolot, Jean-Louis Leclercq

Author Affiliations +

Proceedings Volume 10587, Optical Microlithography XXXI; 105870S (2018) https://doi.org/10.1117/12.2292312
Event: SPIE Advanced Lithography, 2018, San Jose, California, United States

Abstract

Biopolymers represent natural, renewable and abundant materials. Their use is steadily growing in various areas (food, health, building …) but, in lithography, despite some works, resists, solvents and developers are still oil-based and hazardous chemicals. In this work, we replaced synthetic resist by chitosan, a natural, abundant and hydrophilic polysaccharide. High resolution sub-micron patterns were obtained through chitosan films as water developable, chemically unmodified, positive tone mask resist for an eco-friendly electron beam and deep-UV (193 nm) lithography process. Sub-micron patterns were also successfully obtained using a 248 nm photomasker thanks to the addition of biosourced photoactivator, riboflavin. Patterns were then transferred by plasma etching into silica even for high resolution patterns.

Conference Presentation

Citation Download Citation

Mathieu Caillau, Céline Chevalier, Pierre Crémillieu, Thierry Delair, Olivier Soppera, Benjamin Leuschel, Cédric Ray, Christophe Moulin, Christian Jonin, Emmanuel Benichou, Pierre-François Brevet, Christelle Yeromonahos, Emmanuelle Laurenceau, Yann Chevolot, and Jean-Louis Leclercq "Sub-micron lines patterning into silica using water developable chitosan bioresist films for eco-friendly positive tone e-beam and UV lithography ", Proc. SPIE 10587, Optical Microlithography XXXI, 105870S (20 March 2018); https://doi.org/10.1117/12.2292312

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available