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The papers in this volume were part of the technical conference cited on the cover and title page. Papers were selected and subject to review by the editors and conference program committee. Some conference presentations may not be available for publication. Additional papers and presentation recordings may be available online in the SPIE Digital Library at SPIEDigitalLibrary.org. The papers reflect the work and thoughts of the authors and are published herein as submitted. The publisher is not responsible for the validity of the information or for any outcomes resulting from reliance thereon. Please use the following format to cite material from these proceedings: Author(s), “Title of Paper,” in Optical Metrology and Inspection for Industrial Applications V, edited by Sen Han, Toru Yoshizawa, Song Zhang, Proceedings of SPIE Vol. 10819 (SPIE, Bellingham, WA, 2018) Seven-digit Article CID Number. ISSN: 0277-786X ISSN: 1996-756X (electronic) ISBN: 9781510622364 ISBN: 9781510622371 (electronic) Published by SPIE P.O. Box 10, Bellingham, Washington 98227-0010 USA Telephone +1 360 676 3290 (Pacific Time) ∙ Fax +1 360 647 1445 Copyright © 2018, Society of Photo-Optical Instrumentation Engineers. Copying of material in this book for internal or personal use, or for the internal or personal use of specific clients, beyond the fair use provisions granted by the U.S. Copyright Law is authorized by SPIE subject to payment of copying fees. The Transactional Reporting Service base fee for this volume is $18.00 per article (or portion thereof), which should be paid directly to the Copyright Clearance Center (CCC), 222 Rosewood Drive, Danvers, MA 01923. Payment may also be made electronically through CCC Online at copyright.com. Other copying for republication, resale, advertising or promotion, or any form of systematic or multiple reproduction of any material in this book is prohibited except with permission in writing from the publisher. The CCC fee code is 0277-786X/18/$18.00. Printed in the United States of America. Publication of record for individual papers is online in the SPIE Digital Library. Paper Numbering: Proceedings of SPIE follow an e-First publication model. A unique citation identifier (CID) number is assigned to each article at the time of publication. Utilization of CIDs allows articles to be fully citable as soon as they are published online, and connects the same identifier to all online and print versions of the publication. SPIE uses a seven-digit CID article numbering system structured as follows:
AuthorsNumbers in the index correspond to the last two digits of the seven-digit citation identifier (CID) article numbering system used in Proceedings of SPIE. The first five digits reflect the volume number. Base 36 numbering is employed for the last two digits and indicates the order of articles within the volume. Numbers start with 00, 01, 02, 03, 04, 05, 06, 07, 08, 09, 0A, 0B…0Z, followed by 10-1Z, 20-2Z, etc. Aketagawa, Masato, 07, 0C, 1F Alghazi, Abai, 04 Altmann, Bettina, 0S An, Guofei, 04 Artigas, Roger, 0D Bai, Yang, 1W Beermann, Rüdiger, 0E Bermudez, Carlos, 0D Cai, Chuan, 0L Cai, He, 04 Cai, Shan, 1Q Chen, Chao, 1C Chen, Hanqiao, 10 Chen, JianJun, 1E Chen, Qian, 0G Chen, Sirui, 16 Chen, Wenjun, 1K Chen, Xinjian, 1U Chen, Zhaogen, 1U Chen, Zhe, 0Q Cheng, Xiaosheng, 1T Choi, Samuel, 0N Cui, Haihua, 1T Dai, Kang, 04 Deng, Guangwei, 15 Ding, Yueqing, 17 Duan, Yuyan, 0J Duong, Quang-Anh, 07 Enoki, Kenta, 1F Fen, Teng, 10 Feng, Guojin, 1P Feng, Qingchun, 1S Feng, Shijie, 0G Gan, Haiyong, 1P Gao, Nan, 19 Gao, Xiaoting, 0J Ge, Baozhen, 0H Gelloz, Bernard, 0K, 0R Gu, Guoqing, 0Z Gui, Yingyi, 1P Guo, Chenxu, 0O Guo, Wenjiang, 0Y Guo, Yongxing, 09 Hæggström, Edward, 0D Han, Juhong, 04 Han, Sen, 11, 1Z Hausotte, Tino, 0W He, Anzhi, 1I, 1M, 1N He, Yingwei, 0L, 1P He, Yonghong, 16 Higuchi, Masato, 07, 0C Hu, Jingpei, 1R Hu, Yanmin, 1J Huang, Huijie, 1R Huang, Jinbao, 1E Huang, Wencai, 10 Huang, Xin, 11 Järvinen, Miikka, 0D Jia, Jun, 1J Jia, Zhaoyi, 03 Jiang, Kai, 1S Jiang, Lin, 18 Jiang, Shanping, 0P Jin, Lianhua, 0K, 0R Kamagara, Abel, 0M, 0V Kanazawa, Naobumi, 0K Kassamakov, Ivan, 0D Kästner, Markus, 0E Kondoh, Eiichi, 0K, 0R Kowa, Hiroyuki, 0R Leng, Wei, 0P Li, Bin, 15 Li, Cuiling, 1S Li, Gongfa, 09 Li, Hao, 15 Li, Hongsong, 0P Li, Jie, 0M Li, Lin, 1P Li, LinFu, 1E Li, Shaoliang, 12 Li, Shiguang, 0O Li, Sikun, 0V Li, Wei, 1X Li, Xinni, 1S Li, Yunpeng, 0H Li, Zhaojie, 1T Li, Zhenhua, 1I, 1M, 1N Liao, Wenhe, 1T Liu, Hui, 18 Liu, Linbo, 1U Lu, Lei, 03 Luan, Yinsen, 03 Luo, Hang, 0T Luo, Songjie, 0N Lyu, Yi, 1J Ma, Hui, 16 Ma, Long, 1J Ma, Tao, 1C Ma, Yandy, 0X Mannion, Anthony J. P., 0X, 0Y Martinez, Pol, 0D Meng, Haifeng, 0L Metzner, Sebastian, 0W Mitsunari, Toshiyasu, 08 Miyatsu, Nobuto, 0K Mo, Jianhua, 1U Nguyen, Thanh-Dong, 07 Niu, Zhenqi, 12 Nolvi, Anton, 0D Nozawa, Itta, 08 Nulahemaiti, Niyaziaili, 04 O’Brien, Stephen, 0X, 0Y Okamoto, Yuji, 08 Pape, Christian, 0S, 0T Pei, Xin, 1J Peng, Changzhe, 0M, 0V Pi, Yiqiang, 0O Pu, Jixiong, 0N Qian, Jin, 1Q Qiu, Chengchun, 0Z Qiu, Kun, 15 Qiu, Lirong, 1O Qu, Xiangju, 1I, 1M, 1N Quentin, Lorenz, 0E Rao, Gang, 0Q Reithmeier, Eduard, 0E, 0I, 0S, 0T Ru, Qiaoqiao, 1C Sandler, Niklas, 0D Sasaki, Osami, 0N Shao, Rongjun, 1O Shao, Xiao, 1U Sheng, Ranran, 1L Shi, Chunying, 1Q Song, Haizhi, 15 Song, Jian, 1S Song, Yang, 1I, 1M, 1N Su, Ying, 18 Sun, Hao, 11 Sun, Xiaohong, 1W Suzuki, Takamasa, 0N Tang, Feng, 0M Tao, Bo, 09 Tao, Lei, 17 Tao, Tianyang, 0G Tian, Qingguo, 0H, 0J Tian, Wei, 1T Töberg, Stefan, 0I Vainikka, Tuomas, 0D Viitala, Tapani, 0D Wang, Changsi, 1P Wang, Danyi, 0P Wang, Fang, 11 Wang, Hanping, 1Q Wang, Haoyu, 1Z Wang, Jianbo, 1Q Wang, Long, 17 Wang, Quanzhao, 1Z Wang, Rui, 10 Wang, Shunyan, 04 Wang, Xiangzhao, 0M, 0V Wang, Xiu, 1S Wang, Yixuan, 1X Wang, You, 04, 15 Wang, Yun, 1O Wang, Yunxiang, 15 Wang, Zhao, 1W Wei, Dong, 07, 0C, 1F Wei, Zhangfan, 1R Wu, Peng, 11 Wu, Zhipeng, 0O Xi, Jiangtao, 03 Xia, Min, 1X Xiao, Shuqi, 0J Xiao, Sixuan, 0O Xie, Dongdong, 0O Xiong, Limin, 0L, 1P Xiong, Yanbin, 10 Xu, Guizhong, 0Z Xu, Jian, 17 Xu, Jing, 0Q Xu, Shuang, 09 Xu, Xing, 0Z Xu, Xueyang, 12 Xue, Qi, 1W Yamazaki, Kazunori, 08 Yan, Jingyun, 18 Yan, Sitao, 19 Yang, Huiru, 10 Yang, Linhua, 0P Yang, Yinghao, 0O Ye, Huiying, 1W Yin, Cong, 1Q Yin, Wei, 0G Yin, Yongkai, 0S Yoshizawa, Toru, 0K Yu, Qiang, 04 Yu, Xiaojun, 1U Yu, Yan, 17 Yuan, Qiao, 1R Zeng, Aijun, 1R Zeng, Nan, 16 Zhan, Dongjian, 16 Zhang, Bifeng, 0L Zhang, Bolun, 0P Zhang, Fei, 0Z Zhang, Fugen, 0H Zhang, Jing, 0O Zhang, Junchao, 0L, 1P Zhang, Lei, 1I Zhang, Pengsong, 0P Zhang, Qiyuan, 1Z Zhang, Ruiming, 15 Zhang, Ruirui, 1O Zhang, Wei, 04 Zhang, Xiangchao, 12 Zhang, Xiaodi, 1T Zhang, Zonghua, 19 Zhao, Wanliang, 12 Zhao, Weiqian, 1O Zhao, Weiqiang, 18 Zhen, Zhang, 1K, 1L Zheng, Zheng, 1K, 1L Zhou, Heng, 15 Zhou, Qiang, 15 Zhou, Sen, 17 Zhou, Taogeng, 1P Zhou, Wanxin, 0J Zhou, Wenwei, 1M Zhu, Chunhua, 03 Zhu, Yifan, 12 Zhu, Yingwei, 1N Zuo, Chao, 0G Symposium CommitteesGeneral Chairs
General Co-chairs
Technical Program Chairs
Technical Program Co-chairs
Local Organizing Committee Chair Local Organizing Committee Co-chairs
Local Organizing Committee
Secretaries-General
Executive Organizing Committee
Conference CommitteeConference Chairs
Conference Program Committee
Session Chairs
IntroductionThis is the proceedings of the conference on Optical Metrology and Inspection for Industrial Applications V that was held as part of SPIE/COS Photonics Asia (in Beijing, China, 11–13 October 2018). This conference focuses on methods, analysis, and applications of optical metrology and inspection that have been applied to various industries with a particular emphasis on the manufacturing industry. The field of optical metrology and inspection has rapidly grown to wide acceptance for many industrial applications. For example, the requirements from the absolute measurement of ultra-smooth flatness, industry realized high-speed and downsized measurement systems, and advances in machine/robot vision have provided smart algorithm systems, new lighting systems, and better ways of data transfer. Non-contact methods based on optical interference and imaging principles have seen wide use in the optical/mechanical engineering, semi-conductor/LED and electronics industry, and also made advances in traditional manufacturing areas such as automotive and aerospace manufacturing. These methods are also being used for surface shape and defect inspection, and precision measurements. Recent computing power has made analysis methods such as phase-shifting a viable tool for fast on-line inspection for process control and metrology applications. This conference is intended to address the latest advances and future developments in the areas of optical metrology methods, applications and inspections as they are applied in various industries. In these proceedings, papers submitted to the conference are presented in the following eight sessions: Optical Metrology Methods I to V and Optical Metrology Applications I to III, and one Poster Session. In addition to optical interference principles and techniques, imaging methods and phase-shifting analysis techniques have also become more and more popular in practical applications due to rapid advanced computational processing methods, camera systems, and device technologies including various optoelectrical elements and devices. In the next conference scheduled in 2020, more papers are expected to be presented in those areas as well. Sen Han Toru Yoshizawa Song Zhang |
