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The papers in this volume were part of the technical conference cited on the cover and title page. Papers were selected and subject to review by the editors and conference program committee. Some conference presentations may not be available for publication. Additional papers and presentation recordings may be available online in the SPIE Digital Library at SPIEDigitalLibrary.org. The papers reflect the work and thoughts of the authors and are published herein as submitted. The publisher is not responsible for the validity of the information or for any outcomes resulting from reliance thereon. Please use the following format to cite material from these proceedings: Author(s), “Title of Paper,” in High-Power, High-Energy, and High-Intensity Laser Technology IV, edited by Joachim Hein, Thomas J. Butcher, Proceedings of SPIE Vol. 11033 (SPIE, Bellingham, WA, 2019) Seven-digit Article CID Number. ISSN: 0277-786X ISSN: 1996-756X (electronic) ISBN: 9781510627321 ISBN: 9781510627338 (electronic) Published by SPIE P.O. Box 10, Bellingham, Washington 98227-0010 USA Telephone +1 360 676 3290 (Pacific Time)· Fax +1 360 647 1445 Copyright © 2019, Society of Photo-Optical Instrumentation Engineers. Copying of material in this book for internal or personal use, or for the internal or personal use of specific clients, beyond the fair use provisions granted by the U.S. Copyright Law is authorized by SPIE subject to payment of copying fees. The Transactional Reporting Service base fee for this volume is $18.00 per article (or portion thereof), which should be paid directly to the Copyright Clearance Center (CCC), 222 Rosewood Drive, Danvers, MA 01923. Payment may also be made electronically through CCC Online at copyright.com. Other copying for republication, resale, advertising or promotion, or any form of systematic or multiple reproduction of any material in this book is prohibited except with permission in writing from the publisher. The CCC fee code is 0277-786X/19/$18.00. Printed in the United States of America by Curran Associates, Inc., under license from SPIE. Publication of record for individual papers is online in the SPIE Digital Library. Paper Numbering: Proceedings of SPIE follow an e-First publication model. A unique citation identifier (CID) number is assigned to each article at the time of publication. Utilization of CIDs allows articles to be fully citable as soon as they are published online, and connects the same identifier to all online and print versions of the publication. SPIE uses a seven-digit CID article numbering system structured as follows:
AuthorsNumbers in the index correspond to the last two digits of the seven-digit citation identifier (CID) article numbering system used in Proceedings of SPIE. The first five digits reflect the volume number. Base 36 numbering is employed for the last two digits and indicates the order of articles within the volume. Numbers start with 00, 01, 02, 03, 04, 05, 06, 07, 08, 09, 0A, 0B…0Z, followed by 10-1Z, 20-2Z, etc. Badikov, Valerii V., 0Y Bai, Gang, 0T Bartoš, Karel, 06 Bayramian, A., 03 Boháček, Pavel, 0H Buzelis, Rytis, 0O Čech, Miroslav, 0Y Cheng, Bei, 0B Chesnut, K. D., 03 Csanaková, Bianka, 0J David, Samuel Paul, 0E De Vido, Mariastefania, 06 Divoký, Martin, 06 Doroshenko, Maxim E., 0F, 0Y, 0Z Ebrahimzadeh, S., 14 Eisenschreiber, Jan, 10 Erlandson, A., 03 Ertel, Klaus, 06 Fathi, H., 14 Fibrich, Martin, 06, 0H Fraser, James M., 0I Frolov, M. P., 0G Fry, Alan R., 0I Fu, Yuxi, 0K Galvin, T. C., 03 Goya, K., 0G Green, Jonathan Tyler, 06 Gricius, Karolis, 0O Grineviciute, Lina, 0O Hadler, Joshua A., 0A Haefner, C., 03 Hanuš, Martin, 06 Havlák, Lubomír, 0H He, Bing, 0T Hein, Joachim, 0E Houžvička, Jindřich, 06 Jambunathan, Venkatesan, 0E Jelínková, Helena, 0F, 0H, 0J, 0Y, 0Z, 10 Jiao, Zhaoyang, 0B Jurek, Karel, 0H Kaluza, Malte C., 0E Klöpfel, Diethardt, 0E Konyushkin, Vasilii A., 0F, 0Z Körner, Jörg, 0E Korostelin, Yu. V., 0G Košelja, Michal, 06 Kozlovsky, V. I., 0G Kratochvíl, Jan, 0H Kubát, Jan, 06 Lafouti, M., 14 Latifi, H., 14 Lee, Robert, 0A Lehman, John H., 0A Lucianetti, Antonio, 06, 0E Mecseki, Katalin, 0I Midorikawa, Katsumi, 0K Migal, E. A., 0G Mocek, Tomáš, 06, 0E, 0J Mužík, Jirí, 0J N., Rotem, 0D N., Salman, 0D Nabavi, S. H., 14 Nakladov, Andrey N., 0F, 0Z Navrátil, Petr, 06 Nejezchleb, Karel, 10 Němec, Michal, 0H, 0Y Nikl, Martin, 0H Nishimura, Kotaro, 0K Novák, Ondřej, 0J Osiko, Vjatcheslav V., 0F, 0Z P., Eytan, 0D Palashov, Oleg, 0X Pan, Xingcheng, 0B Phillips, Jonathan, 06 Pilař, Jan, 06 Polák, Jan, 06 Potemkin, F. V., 0G Prandolini, Mark J., 0I Preclíková, Jana, 06 Pushkin, A. V., 0G Reiter, Jürgen, 0E Říha, Adam, 0Y Robinson, Joseph S., 0I Rogers, Kyle, 0A Roškot, Lukáš, 0J Rus, Bedřich, 06 S., Uziel, 0D Sarabi, H., 14 Sarikhani, S., 14 Shao, Ping, 0B Shen, Hui, 0T Shen, Weixing, 0B Siders, C. W., 03 Sistrunk, E., 03 Skasyrsky, Ya. K., 0G Škoda, Václav, 10 Smrž, Martin, 0J Snetkov, Ilya, 0X Spinka, T., 03 Suda, Akira, 0K Šulc, Jan, 0F, 0H, 0Z, 10 Sun, Mingying, 0B Švejkar, Richard, 0F Takahashi, Eiji J., 0K Tavella, Franz, 0I Tokita, S., 0G Tolenis, Tomas, 0O Trunda, Bohumil, 0H Uehara, H., 0G Vatani, V., 14 Veselský, Karel, 0Z Vyhlídal, David, 0Y Williams, Paul A., 0A Windeler, Matthew K. R., 0I Xue, Bing, 0K Yakovlev, Alexey, 0X Yang, Yifeng, 0T Yue, Fangxin, 0E Zhang, Jingpu, 0T Zhang, Xuejie, 0B Zhou, Jun, 0T Zhu, Jianqiang, 0B Conference CommitteeSymposium Chairs
Honorary Symposium Chair
Conference Chairs
Conference Program Committee
Session Chairs
IntroductionThis SPIE proceedings volume summarizes modern applications of lasers in science and industry and demand technology that has been pushed to the limits. High peak power and high energy are required for research on laser plasma interactions, whereas high average power is the key parameter in many material processing tools. Diode pumped solid state laser technology has continued to drive high efficiency and performance improvements across the spectrum. Papers featured in this volume illustrate that its foundation, namely laser diodes, is continuously improved. Emerging large-scale facilities such as ELI, Apollon, and HiLASE are undoubtedly pioneers in the field of scientific applications. Consequently, several contributions in this issue review the status of these facilities’ laser systems and new technology developments. Thus far, high pulse energy and average power have typically been achieved in the near-infrared, based on diode pumped Yb- and Nd-lasers, whilst Ti:Sapphire lasers are still the work horses of the high peak power regime. However, in recent years a new trend can be observed: increasing the power and energy of midinfrared sources. These lasers have many applications in science and material processing, as well as their well-established use as spectroscopy tools for pollution detection and similar tasks. This issue reflects this trend by covering research on midinfrared lasers based on Tm, Ho, Er, Cr, and Fe doped host materials as well as alternative approaches via optical parametric amplification. The expansion of high-power lasers into new wavelength ranges in the deep-ultraviolet and mid-infrared and the continued development of their average and peak power necessitates advances in laser materials and frequency conversion techniques. The conference, High-Power, High-Energy, and High-Intensity Laser Technology, and its proceedings are dedicated to the presentation of the novel enabling technologies needed to build even more powerful laser systems in future. The conference committee acknowledges the many contributions from the community as well as contributions to the joint session with the conference, Short-pulse High-energy Lasers and Ultrafast Optical Technologies. Joachim Hein Thomas J. Butcher |