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The papers in this volume were part of the technical conference cited on the cover and title page. Papers were selected and subject to review by the editors and conference program committee. Some conference presentations may not be available for publication. Additional papers and presentation recordings may be available online in the SPIE Digital Library at SPIEDigitalLibrary.org. The papers reflect the work and thoughts of the authors and are published herein as submitted. The publisher is not responsible for the validity of the information or for any outcomes resulting from reliance thereon. Please use the following format to cite material from these proceedings: Author(s), “Title of Paper,” in Modeling Aspects in Optical Metrology VII, edited by Bernd Bodermann, Karsten Frenner, Proceedings of SPIE Vol. 11057 (SPIE, Bellingham, WA, 2019) Seven-digit Article CID Number. ISSN: 0277-786X ISSN: 1996-756X (electronic) ISBN: 9781510627932 ISBN: 9781510627949 (electronic) Published by SPIE P.O. Box 10, Bellingham, Washington 98227-0010 USA Telephone +1 360 676 3290 (Pacific Time) · Fax +1 360 647 1445 Copyright © 2019, Society of Photo-Optical Instrumentation Engineers. Copying of material in this book for internal or personal use, or for the internal or personal use of specific clients, beyond the fair use provisions granted by the U.S. Copyright Law is authorized by SPIE subject to payment of copying fees. The Transactional Reporting Service base fee for this volume is $21.00 per article (or portion thereof), which should be paid directly to the Copyright Clearance Center (CCC), 222 Rosewood Drive, Danvers, MA 01923. Payment may also be made electronically through CCC Online at copyright.com. Other copying for republication, resale, advertising or promotion, or any form of systematic or multiple reproduction of any material in this book is prohibited except with permission in writing from the publisher. The CCC fee code is 0277-786X/19/$21.00. Printed in the United States of America by Curran Associates, Inc., under license from SPIE. Publication of record for individual papers is online in the SPIE Digital Library.
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AuthorsNumbers in the index correspond to the last two digits of the seven-digit citation identifier (CID) article numbering system used in Proceedings of SPIE. The first five digits reflect the volume number. Base 36 numbering is employed for the last two digits and indicates the order of articles within the volume. Numbers start with 00, 01, 02, 03, 04, 05, 06, 07, 08, 09, 0A, 0B…0Z, followed by 10-1Z, 20-2Z, etc. Aguirre-Aguirre, Daniel, 0I Alvarado-Martínez, J. J., 1T Andrle, Anna, 0M Aronstein, David L., 0P Avendaño-Alejo, Maximino, 1S Baev, Sergei S., 1E Bakshaev, Maxim K., 1O Barnes, Bryan M., 0K Beckhoff, Burkhard, 0M Bischoff, Jörg, 0F Bodermann, Bernd, 0D, 0R Bravo-Medina, B., 05 Bruns, Florian F., 0B Bui, Dinh Bao, 1M Burada, Dali R., 08, 1J Burger, Sven, 0M Bussutil, Mehdi, 0U Campos-García, Manuel, 0I, 1L, 1N Castán-Ricaño, Diana, 1S Chaudhry, Sukant, 0H Chemesova, E. V., 14 Chen, Chao, 0Q Chen, Xiuguo, 0Q Clermont, L., 0Z Cornejo-Rodríguez, Alejandro, 1S, 1T Coupland, Jeremy, 13 Csonti, K., 1C Cumming, David R. S., 0C Dejkameh, Atoosa, 03 Deng, Wen, 07 Deng, Zhongwen, 07 Dewa, Paul G., 0P Dickmann, Johannes, 0B, 0R Dickmann, Walter, 0B Docherty, Kevin, 0C Donchenko, S. S., 14 Dubrov, A. V., 1Q Dubrov, V. D., 1Q Dwivedi, Ashish, 1J Ekinci, Yasin, 03 Ezhova, Kseniia, 1A Fedorenko, Dmitry, 1A Felgner, A., 0G Fernandez, Sara, 03 Fischer, Andreas, 0E Freitag, Christoph, 10 Frisvad, Jeppe Revall, 17 Gao, S., 0G Ghosh, Amitava, 08 Gorbatsevich, Vladimir, 1D Granados-Agustín, Fermín Salomon, 1L, 1S, 1T Granet, Gerard, 0F Grant, James, 0C Grejda, Robert D., 0P Gross, Herbert, 10 Gubanova, Ludmila Aleksandrovna L. A., 19, 1M Guo, Zhen, 0X Guskov, Ilya A., 1O Hammerschmidt, Martin, 0M Hannemose, Morten, 17 Hao, Danni, 0C Henn, Mark-Alexander, 0K Henry, David, 0C Hönicke, Philipp, 0M Huerta-Carranza, Oliver, 1N Hüser, D., 0G Jeffrey, Graham, 0C Ji, Chen-Chen, 06, 0X Jia, Xingyu, 07 Käseberg, Tim, 0R Kayser, Yves, 0M Kazakov, V. I., 1G Kazazis, Dimitrios, 03 Kenney, Mitchell, 0C Khan, Gufran S., 08, 1J Koenders, L., 0G Kolmogorov, O. V., 14 Köning, Rainer, 0D Korotaev, Valery V., 1E Kovács, A. P., 1C Kroker, Stefanie, 0B, 0R Krüger, Jan, 0D Kühmstedt, Peter, 10 Kuzmin, Vladimir N., 1E Lamb, Robert A., 0C Leach, Richard, 13 Lechuga-Núñez, José Antonio, 0I Li, Jianhui, 0T Li, Pei-Hang, 06 Li, Yanqiu, 0T Liu, Shiyuan, 0Q Liu, Zhigang, 07 Locans, Uldis, 03 Lu, Ming-Feng, 06, 0X Mack, Stephen K., 0P MacKay, Peter, 0C Macleod, Donald, 0C Manske, Eberhard, 0F Marrugo, Andres G., 1R Martínez-Rodríguez, Ángel Eugenio, 1L, 1N Mastylo, Rostyslaw, 0F Mazy, E., 0Z Melnichenko, Mikhail, 1D Melnikov, Andrey N., 1O Mészáros, G., 1C Michaels, Robert L., 0P Michaloski, Paul F., 0P Michel, C., 0Z Mikulewitsch, Merlin, 0E Mills, Gordon, 0C Mirzade, Fikret Kh., 1P, 1Q Mishra, Vinod, 08 Mochi, Iacopo, 03 Moreno-Oliva, Victor Iván, 1N Moskaletz, O. D., 1G Muñoz-Potosi, Andrea, 1S Muslimov, Eduard R., 1O Nebling, Ricarda, 03 Nekrylov, Ivan S., 1E Ngo, Thai Phi, 19 Nguyen, Duy Hung, 1A Nguyen, Van Ba, 1M Nikolaev, Nikolay, 13 Notni, Gunther, 10 Ostendorf, Andreas, 1B Pant, Kamal K., 08, 1J Pant, L. M., 08 Peña-Conzuelo, Andrés, 0I Percino-Zacarías, Elizabeth, 1S, 1T Pham, Van Hoa, 19 Pineda, Jesus, 1R Ponceau, Damien, 0U Prokhorov, D., 14 Rajeev, Rajendran, 03 Rodrigues, Joel J. P. C., 1E Romero, Lenny A., 1R Saetchnikov, Anton, 1B Saetchnikov, Vladimir, 1B Salido-Monzú, David, 0H Santiago-Alvarado, Agustín, 1N Schneider, Philipp-Immanuel, 0M Scholze, Frank, 0M Shakher, Chandra, 08 Sharma, Anurag, 1J Siefke, Thomas, 0R Silver, Richard M., 0K Sinzinger, Stefan, 08 Soltwisch, Victor, 0M Sorel, Marc, 0C Spaulding, Duncan C., 0P Stöbener, Dirk, 0E Strojnik, M., 05 Su, Rong, 13 Tao, Ran, 06, 0X Tcherniavskaia, Elina, 1B Thomas, Matthew, 13 Tomskiy, Konstantin A., 1E Tseng, Li-Ting, 03 v. Freyberg, Axel, 0E Vaganov, M. A., 1G Valdivieso-González, Gabriel, 1S Vargas, Raul, 1R Vargas-Alfredo, Celestino, 1N Vau, Bernard, 0U Vázquez-Montiel, S., 1T Vygolov, Oleg, 1D Wang, Cai, 0Q Wang, Jiazhi, 0T Wieser, Andreas, 0H Wilm, Jakob, 17 Wu, Jin-Min, 06, 0X Wurm, Matthias, 0R Yan, Zhaojun, 0W Yang, Pengqian, 0W Zhang, Feng, 06, 0X Zhou, Guodong, 0T Zhou, Hui, 0K Conference CommitteeSymposium Chairs
Honorary Symposium Chair Conference Chair Conference Co-chairs
Conference Programme Committee
Session Chairs
IntroductionThe conference, Modelling Aspects in Optical Metrology 2019, was organised for the seventh time as part of the SPIE Optical Metrology symposium, which was co-located with World of Photonics Congress 2019 in Munich, Germany. This conference is dedicated to establishing a forum to present and discuss the basic methods, techniques, and algorithms, which are necessary for a proper modelling and simulation of applied optical metrology techniques. Special emphasis is placed on the description and modelling of new methods, algorithms, components, or complete measurement systems. Optical metrology methods are in general fast, non-destructive, reliable, and flexible, but can nevertheless reach a high level of sensitivity. Therefore, their use in industrial applications like process development or production control is continuously increasing. Concurrently, the metrological requirements are soaring rapidly, leading to a strong demand for both methodical extensions and improved metrology methods. To exploit the full potential of optical metrology it is of utmost importance to be able to fully understand the optical measurement process, which requires the ability of quantitatively predicting the dependence of the output of an optical sensor or measurement system on certain variations of the measurement object, the sensor itself, or the measurement environment. Only if these influences on the measurement result are well understood and appropriately considered in a suitable model of the measurement process, can the measurement result and its associated measurement uncertainty be used for reliable control of production processes. This in-depth understanding usually requires, or is at least strongly supported by, a reliable modelling or simulation of the optical measurement process. In this sense, modelling is a prerequisite for traceable and comparable measurements. This is particularly essential for recent and novel approaches in optical nanoscopy to bridge the gap between super-resolution imaging and real metrological applications. Examples of important topics are interaction of light with matter on the nanoscale or the high accuracy description of light propagation in optical systems. Relevant applications range from optical metrology and inspection of nanostructures on masks and wafers in semiconductor industry, display production, advanced photovoltaics, the investigation of grating structures and grating-based devices, the metrology of surfaces and layers to characterisation of complex optical systems. In many applications, nanometer or sub-nanometer measurement uncertainties are required. New and very interesting fields of application will arise in the physical and dimensional characterisation and the theoretical description of new and effective optical materials like photonic crystals and metamaterials or in the strongly emerging field of quantum (optical) metrology. Accurate modelling of these promising methods and devices will enable both a better understanding of the physics and exploitation of corresponding sensing applications and will be the basis to move such novel approaches from proof-of-principle research quantitative metrology applications. We would like to thank all contributors, participants, the SPIE staff, and the members of the program committee as well as the co-chair, Karsten Frenner, for their support and for turning this conference again into a great success. Bernd Bodermann |
