Large dies stitching: a technical and cross-functional teams challenge

Philippe Morey-Chaisemartin; Eric Beisser; Frederic Brault; Farid Benzakour

doi:10.1117/12.2536739

26 September 2019 Large dies stitching: a technical and cross-functional teams challenge

Philippe Morey-Chaisemartin, Eric Beisser, Frederic Brault, Farid Benzakour

Proceedings Volume 11148, Photomask Technology 2019; 111481A (2019) https://doi.org/10.1117/12.2536739
Event: SPIE Photomask Technology + EUV Lithography, 2019, Monterey, California, United States

Abstract

This paper addresses large dies stitching challenges. Stitching is a way to combine several shots "stitched together" to create a die larger than what can fit on a photomask. This technique that was originally dedicated to advanced research is now more widely used and requires a fully automated industrial flow. Technical constraints come from a number of different actors and results must be shared by even more teams. We will present the methodology used to optimize both the yield and the data exchange between cross-functional teams. We will show how this automated flow can be easily customized to save more silicon thanks to advanced dicing techniques.

Conference Presentation

Citation Download Citation

Philippe Morey-Chaisemartin, Eric Beisser, Frederic Brault, and Farid Benzakour "Large dies stitching: a technical and cross-functional teams challenge", Proc. SPIE 11148, Photomask Technology 2019, 111481A (26 September 2019); https://doi.org/10.1117/12.2536739

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