Open Access Presentation
22 February 2021 JSR Micro, Inc.: JSR patterning materials for semiconductor manufacturing
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Abstract
JSR developed family of photoresist, topcoats, underlayer materials and process chemicals for semiconductor manufacturing. JSR’s high performance lithography materials are utilized in various critical and non-critical lithography applications. JSR underlayer materials are key enabler of complex patterning schemes at advanced technology node. JSR is also a leader in process chemicals solutions including advanced cleans technology, materials for packaging and CMP materials. Our process materials solutions are essential part of advance semiconductor manufacturing.
Conference Presentation
© (2021) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Ramakrishnan Ayothi "JSR Micro, Inc.: JSR patterning materials for semiconductor manufacturing", Proc. SPIE 11669, Advanced Lithography 2021: Exhibitor Product Demos, 1166904 (22 February 2021); https://doi.org/10.1117/12.2592994
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