Some trends in optical metrology

O. V. Angelsky; Zheng Jun

doi:10.1117/12.2571152

31 December 2020 Some trends in optical metrology

O. V. Angelsky, Zheng Jun

Proceedings Volume 11718, Advanced Topics in Optoelectronics, Microelectronics and Nanotechnologies X; 117180Z (2020) https://doi.org/10.1117/12.2571152
Event: Advanced Topics in Optoelectronics, Microelectronics and Nanotechnologies 2020, 2020, Online Only

Abstract

This paper offers some of the achievements of modern optical metrology. The basic approach of metrology from the nano to the pico level optical measurements is considered in this paper. Control of nano (micro) particle motion by an optical field and their using for testing complex optical fields is presented, as a general concepts of optical field metrology. Optical metrology, which is provided by three-dimensional polarization distributions of optical fields, where structured light plays a special role; by using femtosecond lasers, and much more, demonstrates the prospects of optical methods in modern measuring systems.

Citation Download Citation

O. V. Angelsky and Zheng Jun "Some trends in optical metrology", Proc. SPIE 11718, Advanced Topics in Optoelectronics, Microelectronics and Nanotechnologies X, 117180Z (31 December 2020); https://doi.org/10.1117/12.2571152

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