Spatial And Size Distributions Of Submicron Particles In rf Plasmas

K. R. Stalder

doi:10.1117/12.978057

30 January 1990 Spatial And Size Distributions Of Submicron Particles In rf Plasmas

K. R. Stalder

Proceedings Volume 1185, Dry Processing for Submicrometer Lithography; (1990) https://doi.org/10.1117/12.978057
Event: 1989 Microelectronic Integrated Processing Conferences, 1989, Santa Clara, United States

Abstract

Submicron diameter particles were grown and observed in an rf plasma while etching silicon. The plasma, created by an rf discharge in argon-CF2Cl2 mixtures in a parallel plate geometry, was probed by light from a pulsed dye laser. The scattered laser light provided a measure of the size and space distribution of the particles. The particles were observed to be spatially distributed, reaching a peak density just outside the plasma-sheath boundary. Particle size distributions, determined from the pulse-height spectrum of the scattered light intensity, were estimated to peak at radii of less than one micron.

Citation Download Citation

K. R. Stalder "Spatial And Size Distributions Of Submicron Particles In rf Plasmas", Proc. SPIE 1185, Dry Processing for Submicrometer Lithography, (30 January 1990); https://doi.org/10.1117/12.978057

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