Focused Ion Beam Modification And Patterning Of High TC Superconductors

L. R. Harriott

doi:10.1117/12.965165

19 March 1990 Focused Ion Beam Modification And Patterning Of High T_C Superconductors

L. R. Harriott

Proceedings Volume 1187, Processing of Films for High Tc Superconducting Electronics; (1990) https://doi.org/10.1117/12.965165
Event: 1989 Microelectronic Integrated Processing Conferences, 1989, Santa Clara, United States

Abstract

High-resolution patterning of thin-film high temperature superconductors is necessary in the development of device applications of these new materials. Such fine-line structures are necessary in the fabrication of devices such as superconducting quantum interference devices (SQUIDS), transmission lines and others. Furthermore, high spatial resolution patterning can be an important tool in studying the fundamental properties of the films themselves. Focused ion beam patterning has recently been applied to YBaCuO thin films. The finely focused ion beam can produce patterns by local physical sputtering or through implant damage. These techniques have proven to be valuable for producing submicron superconducting structures in a reliable way.

Citation Download Citation

L. R. Harriott "Focused Ion Beam Modification And Patterning Of High T_C Superconductors", Proc. SPIE 1187, Processing of Films for High Tc Superconducting Electronics, (19 March 1990); https://doi.org/10.1117/12.965165

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