Development and application of line measurement Linnik-type white light dispersive interferometer

Tong Guo; Changbin Sun

doi:10.1117/12.2617174

8 July 2022 Development and application of line measurement Linnik-type white light dispersive interferometer

Tong Guo, Changbin Sun

Proceedings Volume 12282, 2021 International Conference on Optical Instruments and Technology: Optoelectronic Measurement Technology and Systems; 1228203 (2022) https://doi.org/10.1117/12.2617174
Event: 2021 International Conference on Optical Instruments and Technology, 2022, Online Only

Abstract

Semiconductor processing technology is the foundation of the development of semiconductor industry, and the manufacturing level will affect the key parameters of semiconductor products. Therefore, it is necessary to develop metrology technique that matches the current semiconductor processing accuracy. White light dispersive interferometry (WLDI) technology, as a highresolution optical metrological technique for measuring complicated surfaces, has been applied in the technical research in the semiconductor inspection. In this paper, the set-up of Linnik type line-scan WLDI system is developed, and the data processing algorithm is proposed to realize the simultaneous measurement of the surface profile and film thickness with high measurement efficiency. The experimental results indicate the current system has a good measurement performance.

Citation Download Citation

Tong Guo and Changbin Sun "Development and application of line measurement Linnik-type white light dispersive interferometer", Proc. SPIE 12282, 2021 International Conference on Optical Instruments and Technology: Optoelectronic Measurement Technology and Systems, 1228203 (8 July 2022); https://doi.org/10.1117/12.2617174

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