Laser-induced direct deposition of thin films: film transfer

Binglin Zhang

doi:10.1117/12.2294779

1 July 1990 Laser-induced direct deposition of thin films: film transfer

Binglin Zhang

Proceedings Volume 1230, International Conference on Optoelectronic Science and Engineering '90; 12303Y (1990) https://doi.org/10.1117/12.2294779
Event: The Marketplace for Industrial Lasers 1990, 1990, Chicago, IL, United States

Abstract

The process of the laser-induced direct deposition is that the original film on the back side of an optically transparent substrate is directly transferred to a target substrate locatted behind the film by focused pulsed laser radiation[ 1] . Only a small region of the original film, which is exposed by focused laser rediatiom, can be transferred to the target substrate using this technique. Obviously, the advantage of the new technique is to fabricate micro spots of thin films. In principle, micrometer spot of thin film can be fabricated by this technique, because laser beam can be focused in micrometer spot. Probably it is a potentially powerful technique for the fabrication of micro and opto-electronics devices.

Citation Download Citation

Binglin Zhang "Laser-induced direct deposition of thin films: film transfer", Proc. SPIE 1230, International Conference on Optoelectronic Science and Engineering '90, 12303Y (1 July 1990); https://doi.org/10.1117/12.2294779

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