The surface temperature on the back surface of substrate in the pyrolytic LCVD

Jie Zhang

doi:10.1117/12.2294785

1 July 1990 The surface temperature on the back surface of substrate in the pyrolytic LCVD

Jie Zhang

Proceedings Volume 1230, International Conference on Optoelectronic Science and Engineering '90; 123044 (1990) https://doi.org/10.1117/12.2294785
Event: The Marketplace for Industrial Lasers 1990, 1990, Chicago, IL, United States

Abstract

The surface temperature is an important parameter in LCVD which affects the characteristics of film deposition and determines its rate. The surface temperature in pyrolytic LCVD has been studied theoretically (1), some people used the other methods to measure the surface temperature such as pyrometry (2) and Ni-Au thin film thermocouple (3). But thermocouple may disturb the absorption of the incident light, and the process of the film deposition, by the reflection change, the temperature is changable during the deposition, and this phenomenon is called self-limit effect. In this paper, a new method for measuring the increase of surface temperature and the steady -temperature distribution with micro-thermocouple by CW CO2 Laser is proposed without the self -limit effect. In order to avoid the reflection of micro-thermocouple, the CW CO2 Laser was irradiated on the back of surface which was kept in the deposition used for pyrolysis of organic compound on it.

Citation Download Citation

Jie Zhang "The surface temperature on the back surface of substrate in the pyrolytic LCVD", Proc. SPIE 1230, International Conference on Optoelectronic Science and Engineering '90, 123044 (1 July 1990); https://doi.org/10.1117/12.2294785

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