Monitoring the thickness of ZnO films on iso-axis magnetron sputtering using laser

Kecheng Xie

doi:10.1117/12.2294798

1 July 1990 Monitoring the thickness of ZnO films on iso-axis magnetron sputtering using laser

Kecheng Xie

Proceedings Volume 1230, International Conference on Optoelectronic Science and Engineering '90; 12304H (1990) https://doi.org/10.1117/12.2294798
Event: The Marketplace for Industrial Lasers 1990, 1990, Chicago, IL, United States

Abstract

The film thickness monitoring technology is one of the factors in film manufacture. In isoaxis magnetron sputtering, to detect the film thickness in real time is very important. This paper presented a method which can monitor the thickness of ZnO films in a simple, quick and accurate way as well as in real time. The method is to trace the substrates on a TCT-300 type isoaxis magnetron sputtering machine using laser directly. The sputtering machine is made in our institute.

Citation Download Citation

Kecheng Xie "Monitoring the thickness of ZnO films on iso-axis magnetron sputtering using laser", Proc. SPIE 1230, International Conference on Optoelectronic Science and Engineering '90, 12304H (1 July 1990); https://doi.org/10.1117/12.2294798

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