Poster + Presentation + Paper
19 December 2022 Analyzing the tolerances on direct laser writing of two-dimensional Dammann gratings and performing the software correction of writing modes
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Conference Poster
Abstract
As applied to a maskless laser lithography writing system Heidelberg DWL 66+ and the photoresist-chromium technology, we have found the tolerances on fabricating the binary-phase Dammann gratings having 7x7 useful diffraction orders and a structure separable in X and Y components and illuminated by a beam with a wavelength of 633 nm. It has been found that the obtained tolerances guarantee the production of Dammann gratings with a total diffraction efficiency close to the theoretical one and a root-mean-square error of departure of the intensity of useful diffraction orders of less than 10%.
Conference Presentation
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Victor P. Korolkov, Andrey G. Sedukhin, Roman I. Kuts, Vadim V. Cherkashin, Sergey K. Golubtsov, Anatoly I. Malyshev, and Dmitrij A. Belousov "Analyzing the tolerances on direct laser writing of two-dimensional Dammann gratings and performing the software correction of writing modes", Proc. SPIE 12318, Holography, Diffractive Optics, and Applications XII, 123182G (19 December 2022); https://doi.org/10.1117/12.2643720
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KEYWORDS
Photoresist materials

Diffraction

Tolerancing

Diffraction gratings

Multiphoton lithography

Photomasks

Statistical analysis

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