Presentation + Paper
16 March 2023 Scalable patterning modules for diffractive optics on 300mm substrates
Matthew C. Traub, Myriam Willegems, Sundararajan Thirumalai, Steve Smout, Mohamed Asbahi, Bogumila Kutrzeba-Kotowska, Silvia Lenci, Eleonora Storace
Author Affiliations +
Abstract
Nano-Imprint lithography (NIL) is a powerful technology for low-cost, large area patterning of complex nano-features, including surface relief gratings and meta-structures for AR optical components. A full layer patterning module that includes a NIL process suited for mass manufacturing requires multiple capabilities: nano-imprint tools, materials, template fabrication, potentially pre- or post-imprint material deposition or removal and extensive metrology. Through its longstanding history in the semiconductor industry, imec has developed advanced mastering, deposition, and etch capabilities that can be paired with NIL process development for fully integrated patterning. In this talk, recent developments in integrated surface relief patterning on transparent 300 mm substrates will be presented. Because the fabrication itself is substrate agnostic, this capability can be transferred to other substrate material available at 300 mm to match the design requirements of a variety of diffractive optical components, such as refractive index tuning.
Conference Presentation
© (2023) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Matthew C. Traub, Myriam Willegems, Sundararajan Thirumalai, Steve Smout, Mohamed Asbahi, Bogumila Kutrzeba-Kotowska, Silvia Lenci, and Eleonora Storace "Scalable patterning modules for diffractive optics on 300mm substrates", Proc. SPIE 12449, Optical Architectures for Displays and Sensing in Augmented, Virtual, and Mixed Reality (AR, VR, MR) IV, 1244904 (16 March 2023); https://doi.org/10.1117/12.2649739
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Glasses

Semiconducting wafers

Optical lithography

Silicon

Nanoimprint lithography

Silicon nitride

Etching

Back to Top