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30 April 2023 Refinements of a nanoimprint process simulator
Shingo Ishida, Junichi Seki, Yuichiro Oguchi, Naoki Kiyohara, Koshiro Suzuki, Kohei Nagane, Shintaro Narioka, Yoshihiro Shiode, Sentaro Aihara, Toshiya Asano
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Proceedings Volume 12495, DTCO and Computational Patterning II; 124950N (2023) https://doi.org/10.1117/12.2657058
Event: SPIE Advanced Lithography + Patterning, 2023, San Jose, California, United States
Abstract
For nanoimprint lithography (NIL), computational technologies are still being developed. Only a few simulators are applicable to the nanoimprint process, and these simulators are desired by device manufacturers as part of their everyday toolbox. In this paper, we introduce a new NIL process simulator which simulates the whole imprinting process, and evaluates the quality of the resulting resist film. To overcome the scale difference of each component of the system, which makes it difficult to calculate the process with conventional fluid structure interaction simulators, our simulator utilizes analytically integrated expressions which reduce the dimensions of the calculation region.
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Shingo Ishida, Junichi Seki, Yuichiro Oguchi, Naoki Kiyohara, Koshiro Suzuki, Kohei Nagane, Shintaro Narioka, Yoshihiro Shiode, Sentaro Aihara, and Toshiya Asano "Refinements of a nanoimprint process simulator", Proc. SPIE 12495, DTCO and Computational Patterning II, 124950N (30 April 2023); https://doi.org/10.1117/12.2657058
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KEYWORDS
Nanoimprint lithography
Optical lithography
Device simulation
Lithography
Manufacturing
Manufacturing equipment
Nanotechnology
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