Unsupervised deep learning approach for voltage contrast (VC) image denoising towards device pillars yield analysis

Bappaditya Dey; Victor Blanco; Sandip Halder

doi:10.1117/12.2658541

30 April 2023 Unsupervised deep learning approach for voltage contrast (VC) image denoising towards device pillars yield analysis

Bappaditya Dey, Victor Blanco, Sandip Halder

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Proceedings Volume 12496, Metrology, Inspection, and Process Control XXXVII; 124961Q (2023) https://doi.org/10.1117/12.2658541
Event: SPIE Advanced Lithography + Patterning, 2023, San Jose, California, United States

Abstract

This conference presentation was prepared for SPIE Advanced Lithography + Patterning, 2023.

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Bappaditya Dey, Victor Blanco, and Sandip Halder "Unsupervised deep learning approach for voltage contrast (VC) image denoising towards device pillars yield analysis", Proc. SPIE 12496, Metrology, Inspection, and Process Control XXXVII, 124961Q (30 April 2023); https://doi.org/10.1117/12.2658541

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