Femtosecond pulse generation at 193 nm

Sandor Szatmari; Fritz P. Schaefer

doi:10.1117/12.20318

1 August 1990 Femtosecond pulse generation at 193 nm

Sandor Szatmari, Fritz P. Schaefer

Proceedings Volume 1268, Applications of Ultrashort Laser Pulses in Science and Technology; (1990) https://doi.org/10.1117/12.20318
Event: The International Congress on Optical Science and Engineering, 1990, The Hague, Netherlands

Abstract

A compact excimer-dye laser system is developed for subpicosecond pulse generation at 193 nm. In this setup a double-discharge excimer laser (EMG 150) is used both for pumping the seed-pulse generator and for amplification. The seed-pulse generator is a distributed-feedback dye-laser-based subpicosecond dye laser system, generating a 400 fs pulse at 537 nm and a broadband nanosecond pulse centered at 690 nm. By sending these pulses through a H2 Raman cell in a collinear beam, part of the red pulse is amplified, which coincides with the spectral and temporal gain window of the Raman amplifier pumped by the transform-limited 537-nm pulse. Phase-matched frequency mixing of these Raman-amplified pulses with the frequency-doubled 537-nm pulses results in seed-pulse energies of more than 0.1 jJ at 193 nm, with good spatial, spectral and amplitude stability. By double-pass amplification of the seed pulses in the amplifier section of the EMG 150 excimer laser, typically 0.5 mJ output pulses of -800 fs duration are obtained in a 6 mm diameter circular beam. Additional pulse compression in a prism compressor resulted in significant decrease of the pulse duration to less than 400 fs.

Citation Download Citation

Sandor Szatmari and Fritz P. Schaefer "Femtosecond pulse generation at 193 nm", Proc. SPIE 1268, Applications of Ultrashort Laser Pulses in Science and Technology, (1 August 1990); https://doi.org/10.1117/12.20318

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