Towards efficient and accurate cost functions for EUVL stochastic-aware OPC correction and verification: via failure probability versus image and process variation band metrics

Shuling Wang; Azat Latypov; Shumay Shang; Germain Fenger; Chih-I Wei; Xima Zhang

doi:10.1117/12.3010912

10 April 2024 Towards efficient and accurate cost functions for EUVL stochastic-aware OPC correction and verification: via failure probability versus image and process variation band metrics

Shuling Wang, Azat Latypov, Shumay Shang, Germain Fenger, Chih-I Wei, Xima Zhang

Author Affiliations +

Proceedings Volume 12953, Optical and EUV Nanolithography XXXVII; 1295319 (2024) https://doi.org/10.1117/12.3010912
Event: SPIE Advanced Lithography + Patterning, 2024, San Jose, California, United States

Conference Poster

Abstract

Traditional approaches to quantifying stochastic EUVL variability for the use in stochastic-aware OPC correction and verification algorithms are tested against the stochastic EUVL via failure probability calculation by the Calibre stochastic model. The purpose is to check if these simplified approaches, based on the image metrics (e.g., NILS) or PV band parameters may provide an accurate failure probability prediction for a broad variety of layouts typical for the via layers of modern ICs. We also present the examples of verification of the Calibre stochastic model failure probability predictions against the brute force Monte Carlo trials.

(2024) Published by SPIE. Downloading of the abstract is permitted for personal use only.

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Shuling Wang, Azat Latypov, Shumay Shang, Germain Fenger, Chih-I Wei, and Xima Zhang "Towards efficient and accurate cost functions for EUVL stochastic-aware OPC correction and verification: via failure probability versus image and process variation band metrics", Proc. SPIE 12953, Optical and EUV Nanolithography XXXVII, 1295319 (10 April 2024); https://doi.org/10.1117/12.3010912

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