A paradigm shift in next-generation semiconductor leadership: design-manufacturing co-optimization (DMCO)

Koki Tsurusaki; Masaharu Kobayashi; Mahoro Yoshida; Akio Koyama

doi:10.1117/12.3018033

10 April 2024 A paradigm shift in next-generation semiconductor leadership: design-manufacturing co-optimization (DMCO)

Koki Tsurusaki, Masaharu Kobayashi, Mahoro Yoshida, Akio Koyama

Proceedings Volume 12954, DTCO and Computational Patterning III; 1295407 (2024) https://doi.org/10.1117/12.3018033
Event: SPIE Advanced Lithography + Patterning, 2024, San Jose, California, United States

Abstract

DMCO combines both aspects of DFM (Design-for-manufacturing) with MFD (Manufacturing-for-design) and promises to accelerate overall design to manufacturing cycle time & overall chip PPAC by leveraging AI, Cloud scalability and big-data analytics to accelerate time-to-market for 2 nanometer and below.

Conference Presentation

(2024) Published by SPIE. Downloading of the abstract is permitted for personal use only.

Citation Download Citation

Koki Tsurusaki, Masaharu Kobayashi, Mahoro Yoshida, and Akio Koyama "A paradigm shift in next-generation semiconductor leadership: design-manufacturing co-optimization (DMCO)", Proc. SPIE 12954, DTCO and Computational Patterning III, 1295407 (10 April 2024); https://doi.org/10.1117/12.3018033

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available