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10 April 2024 An overview of curvilinear OPC algorithms for silicon photonics applications
Mohamed Gheith
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Proceedings Volume 12954, DTCO and Computational Patterning III; 129540P (2024) https://doi.org/10.1117/12.3025295
Event: SPIE Advanced Lithography + Patterning, 2024, San Jose, California, United States
Abstract
Driving the silicon photonics technology along the journey of early development towards high volume manufacturing passes through multiple challenging stages. In this presentation I will be focusing on the challenges facing both optical proximity correction (OPC) and etch compensation for silicon photonics designs versus conventional CMOS designs.
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Mohamed Gheith "An overview of curvilinear OPC algorithms for silicon photonics applications", Proc. SPIE 12954, DTCO and Computational Patterning III, 129540P (10 April 2024); https://doi.org/10.1117/12.3025295
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KEYWORDS
Optical proximity correction
Silicon photonics
Etching
Detection and tracking algorithms
Integrated circuit design
Manufacturing
Photonic integrated circuits
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