|
Curvilinear(CL) mask shapes have showed better lithography performance, including improved process window, better PVband and MEEF compared to Manhattan mask. With the development of Multi-Beam-Mask-Writer (MBMW), the adoption of CL mask in production becomes reality.
However, there are multiple challenges associated with CL data, such as complex mask shape and large data volume. One of the most important challenges is to have a good set of Mask-Rule-Check(MRC) rules which is essential to achieve good OPC mask quality.
Calibre® OPCVerify has been developed for years to check CL shapes. Combining with existing checks, a full suite of CL MRC checks has been added. In this paper, we will present a fully integrated CL verification flow.
|
