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Reactive Low-Voltage Ion Plating (RLVIP) is a plasma-assisted evaporation process
that produces anorganic oxide- and nitride films with a closed microstructure. in
order to better understand the process and the resulting film properties a BALZERS
PPM 400 Plasmamonitor, a combination of a quadrupole mass filter and an energy
selective ion optics, has been used to study the relative abundancies and energy
distributions of the ions impinging on the growing film in the RLVIP process. The
device is discussed and preliminary results are presented: The plasma is anisotropic.
Surprisingly it contains ions with higher energies than expected from the
self-bias potential.
Johannes P. Edlinger andHans K. Pulker
"Ion currents and energies in reactive low-voltage ion plating: preliminary results", Proc. SPIE 1323, Optical Thin Films III: New Developments, (1 December 1990); https://doi.org/10.1117/12.22369
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Johannes P. Edlinger, Hans K. Pulker, "Ion currents and energies in reactive low-voltage ion plating: preliminary results," Proc. SPIE 1323, Optical Thin Films III: New Developments, (1 December 1990); https://doi.org/10.1117/12.22369