KrF-excimer-laser-induced absorption and fluorescence bands in fused silica related to the manufacturing process

Norbert Leclerc; Christoph Pfleiderer; Hermine Hitzler; Stephan Thomas; Ralf Takke; Wolfgang R. Englisch; Juergen M. Wolfrum; Karl-Otto Greulich

doi:10.1117/12.22519

1 October 1990 KrF-excimer-laser-induced absorption and fluorescence bands in fused silica related to the manufacturing process

Norbert Leclerc, Christoph Pfleiderer, Hermine Hitzler, Stephan Thomas, Ralf Takke, Wolfgang R. Englisch, Juergen M. Wolfrum, Karl-Otto Greulich

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Proceedings Volume 1327, Properties and Characteristics of Optical Glass II; (1990) https://doi.org/10.1117/12.22519
Event: 34th Annual International Technical Symposium on Optical and Optoelectronic Applied Science and Engineering, 1990, San Diego, CA, United States

Abstract

Transient and permanent UV absorption bands and fluorescence bands induced by 248 nm excimer laser radiation in fused silica are reported. It is shown that the permanent absorption measurements are not suitable to characterize the material with respect to transmission of high power laser pulses. In fused silica samples with high OH - content recovery of the 210 nm absorption band is observed after the end of irradiation. In samples with low OH - content no quick re covery is observed. 1 .

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Norbert Leclerc, Christoph Pfleiderer, Hermine Hitzler, Stephan Thomas, Ralf Takke, Wolfgang R. Englisch, Juergen M. Wolfrum, and Karl-Otto Greulich "KrF-excimer-laser-induced absorption and fluorescence bands in fused silica related to the manufacturing process", Proc. SPIE 1327, Properties and Characteristics of Optical Glass II, (1 October 1990); https://doi.org/10.1117/12.22519

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