Paper
1 October 1990 Deposition of Y-Ba-Cu-O films on silicon subrates
Alex G. Akimov, S. A. Kozikov, V. G. Krigel, Anatole N. Khodan, Victor N. Bagratashvili
Author Affiliations +
Proceedings Volume 1352, 1st Intl School on Laser Surface Microprocessing; (1990) https://doi.org/10.1117/12.23713
Event: International School on Laser Surface Microprocessing, 1989, Tashkent, Uzbekistan
Abstract
This work was aimed at studies into the basic physic—chemical processes govern ing the interaction between the Y203-4BaO-6CuO oxidefilm being deposited and the silicon substrate and the chemical stability of the Y Ba Cu 0 film on the surface 1 2 •3 7—x of S13N4 layer deposited on silicon.
© (1990) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Alex G. Akimov, S. A. Kozikov, V. G. Krigel, Anatole N. Khodan, and Victor N. Bagratashvili "Deposition of Y-Ba-Cu-O films on silicon subrates", Proc. SPIE 1352, 1st Intl School on Laser Surface Microprocessing, (1 October 1990); https://doi.org/10.1117/12.23713
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KEYWORDS
Silicon

Silicon films

Copper

Oxides

Barium

Silicates

Semiconductor lasers

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