Silica optical integrated devices

Soichi Kobayashi; Shin S. Sumida; Tadashi M. Miyashita

doi:10.1117/12.24984

1 February 1991 Silica optical integrated devices

Soichi Kobayashi, Shin S. Sumida, Tadashi M. Miyashita

Proceedings Volume 1374, Integrated Optics and Optoelectronics II; (1991) https://doi.org/10.1117/12.24984
Event: SPIE Microelectronic Interconnect and Integrated Processing Symposium, 1990, San Jose, United States

Abstract

Silica waveguide integrated technologies have been developed based on a combination of the flame hydrolysis deposition and reactive ion etching which have the advantage of structure controllability and reproducibility. In addition we have developed the hybrid integration of passive components and packaging technology using Yttrium Aluminum Garnet (YAG) laser welding and simple adhesives. Silica optical integrated devices such as lxN splitters wavelength division multiplex/demultiplex (WDM) modules ring resonators Mach-Zehnder interferometers and optical switching devices can be commercially produced with these technologies.

Citation Download Citation

Soichi Kobayashi, Shin S. Sumida, and Tadashi M. Miyashita "Silica optical integrated devices", Proc. SPIE 1374, Integrated Optics and Optoelectronics II, (1 February 1991); https://doi.org/10.1117/12.24984

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