Fourier transform infrared spectrophotometry for thin film monitors: computer and equipment integration for enhanced capabilities

J. Neal Cox; J. Sedayao; Gurmeet S. Shergill; R. Villasol; David M. Haaland

doi:10.1117/12.48957

1 March 1991 Fourier transform infrared spectrophotometry for thin film monitors: computer and equipment integration for enhanced capabilities

J. Neal Cox, J. Sedayao, Gurmeet S. Shergill, R. Villasol, David M. Haaland

Author Affiliations +

Proceedings Volume 1392, Advanced Techniques for Integrated Circuit Processing; (1991) https://doi.org/10.1117/12.48957
Event: Processing Integration, 1990, Santa Clara, CA, United States

Abstract

Fourier transform infrared spectrophotometry (FTIR) is a valuable technique for monitoring thin films used in semiconductor device manufacture. Determinations of the constituent contents in borophosphosilicate (BPSG) phosphosilicate (PSG) silicon oxynitride (SiON:H and spin-on-glass (SOG) thin films are a few applications. Due to the nature of the technique FTIR instrumentation is one of the most extensively computer-dependent pieces of equipment that is likely to be found in a microelectronics plant. In the role of fab monitor or reactor characterization tool FTIR instruments can rapidly generate large amounts of data. Also the drive for greater accuracy and tighter precision is leading to the development of increasingly sophisticated data processing software that tax the computing abilities of most instrument local data stations. By linking a local FTIR data station to a remote minicomputer its capabilities are greatly improved. We discuss three classes of enhancement. First the FTIR in the fab area communicates and interacts in real time with the minicomputer: transferring data segments to it instructing it to perform sophisticated processing and returning the results to the operator in the fab. Characterizations of PSG thin films by this approach are discussed. Second the spectra of large numbers of samples are processed locally. The large database is then transmitted to the minicomputer for study by statistical/graphics software. Results of CVD-reactor spatial profiling experiments for plasma SiON are presented. Third processing of calibration spectra is performed

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J. Neal Cox, J. Sedayao, Gurmeet S. Shergill, R. Villasol, and David M. Haaland "Fourier transform infrared spectrophotometry for thin film monitors: computer and equipment integration for enhanced capabilities", Proc. SPIE 1392, Advanced Techniques for Integrated Circuit Processing, (1 March 1991); https://doi.org/10.1117/12.48957

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KEYWORDS

FT-IR spectroscopy

Data modeling

Spectrophotometry

Infrared radiation

Thin films

Phosphorus

Calibration

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