Paper
1 July 1991 Resonant and nonresonant ionization in sputtered initiated laser ionization spectrometry
George J. Havrilla, Mark Nicholas, Scott R. Bryan, J. Gary Pruett
Author Affiliations +
Proceedings Volume 1435, Optical Methods for Ultrasensitive Detection and Analysis: Techniques and Applications; (1991) https://doi.org/10.1117/12.44226
Event: Optics, Electro-Optics, and Laser Applications in Science and Engineering, 1991, Los Angeles, CA, United States
Abstract
Resonant and nonresonant laser ionization of sputtered neutral atoms are compared for silver/gold alloys and silica/silicon wafer implants. The results obtained from these two different ionization schemes represent complementary information on the sputtered species. There are chemical and photofragmentation effects that must be considered for quantitative determinations of the surface and sub-surface species. Both ionization schemes are necessary to obtain complete information on the sample.
© (1991) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
George J. Havrilla, Mark Nicholas, Scott R. Bryan, and J. Gary Pruett "Resonant and nonresonant ionization in sputtered initiated laser ionization spectrometry", Proc. SPIE 1435, Optical Methods for Ultrasensitive Detection and Analysis: Techniques and Applications, (1 July 1991); https://doi.org/10.1117/12.44226
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Cited by 2 scholarly publications.
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KEYWORDS
Silver

Ionization

Oxides

Silicon

Gold

Iron

Semiconducting wafers

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