Laser conditioning of optical thin films

C. R. Wolfe

doi:10.1117/12.2294445

1 November 1990 Laser conditioning of optical thin films

C. R. Wolfe

Proceedings Volume 1438, Laser-Induced Damage in Optical Materials 1989; 143810 (1990) https://doi.org/10.1117/12.2294445
Event: Laser-Induced Damage in Optical Materials 1989, 1989, Boulder, CO, United States

Abstract

Results are presented that show the damage thresholds of e-beam deposited multi- layer HfO2/SiO2 thin films can be permanently increased by a factor of 2 to 3 by illumination with subthreshold fluences of laser light. This sub-threshold illumination procedure is referred to as "laser conditioning". The films used in this study were prepared by three different physical-vapor-deposition techniques: ion-beam sputtering, plasma plating and e- beam evaporation. Only the e-beam deposited films showed consistent and significant improvement with laser conditioning. Of the material pairs examined (Hf02/Si02, ZrO2/SiO2 and TiO2/SiO2), Hf02/Si02 gave the greatest and most consistent damage improvement with conditioning. The number of layers and the reflective or transmissive characteristics of the HfO2/SiO2 films were found to have little` impact on laser conditioning of the film. The results show that the damage thresholds of a wide range of e-beam deposited coatings (e.g. HR's, polarizers, etc.) can be improved by laser conditioning. Several possible conditioning mechanisms are examined.

Citation Download Citation

C. R. Wolfe "Laser conditioning of optical thin films", Proc. SPIE 1438, Laser-Induced Damage in Optical Materials 1989, 143810 (1 November 1990); https://doi.org/10.1117/12.2294445

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