Paper
1 June 1991 Multishot ablation of thin films: sensitive detection of film/substrate transition by shockwave monitoring
Hans Eckard Hunger, Stefan Petzoldt, H. Pietsch, Juergen Reif, Eckart Matthias
Author Affiliations +
Abstract
During multishot ablation with 248 nm excimer laser pulses for each single laser shot the shock wave emerging from the ablated material was monitored by the acoustic mirage effect. The shockwave parameters turned out to depend sensitively on the nature of the ablated material. In particular during ablation of a polymeric film/Si02/Si multilayer system distinct changes in the deflection signal were found when the ablation was driven through the interface between layers. Inspection by optical microscopy and depth profil ing was used as cross check. 1.
© (1991) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Hans Eckard Hunger, Stefan Petzoldt, H. Pietsch, Juergen Reif, and Eckart Matthias "Multishot ablation of thin films: sensitive detection of film/substrate transition by shockwave monitoring", Proc. SPIE 1441, Laser-Induced Damage in Optical Materials: 1990, (1 June 1991); https://doi.org/10.1117/12.57223
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Cited by 1 scholarly publication.
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KEYWORDS
Laser ablation

Polymers

Silicon

Etching

Polymer thin films

Excimer lasers

Chromium

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