Paper
1 July 1991 High-average-power narrow-band KrF excimer laser
Osamu Wakabayashi, Masahiko Kowaka, Yukio Kobayashi
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Abstract
The conventional line-narrowing methods employed by narrow-band KrF excimer lasers are (1) intracavity etalons and (2) a Littrow grating with beam expansion. They have the following problems in high average power operation: (a) short lifetime of the etalons and large wavelength drift and large line-width change (the etalons method), or (b) low output power and short lifetime of electrodes (the grating method). To solve there problems, a hybrid method consisting of two prism beam expanders, an etalon and a Littrow grating, it proposed. These prism beam expanders decrease the light intensity on the etalon, so that the lifetime of the etalon is increased drastically, the passive wavelength drift is minimized, and the wavelength is adjusted quickly. By employing this system, average power of more than 8 W, line-width of less than 2.5 pm(FWHM), and long-term wavelength stability of less than +-0.5 pm were achieved.
© (1991) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Osamu Wakabayashi, Masahiko Kowaka, and Yukio Kobayashi "High-average-power narrow-band KrF excimer laser", Proc. SPIE 1463, Optical/Laser Microlithography IV, (1 July 1991); https://doi.org/10.1117/12.44820
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CITATIONS
Cited by 2 scholarly publications.
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KEYWORDS
Fabry–Perot interferometers

Excimer lasers

Prisms

Beam expanders

Electrodes

Optical lithography

Control systems

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