Micrograting device using electron-beam lithography

Tsukasa Yamashita; Shigeru Aoyama

doi:10.1117/12.47030

1 September 1991 Micrograting device using electron-beam lithography

Tsukasa Yamashita, Shigeru Aoyama

Proceedings Volume 1507, Holographic Optics III: Principles and Applications; (1991) https://doi.org/10.1117/12.47030
Event: ECO4 (The Hague '91), 1991, The Hague, Netherlands

Abstract

Recent trends in laser application systems such as optical information systems, optical network systems, and optical measurement systems have presented a need for small size, light weight, low cost, and mass productivity. Advantages of a micro grating device in laser beam application systems are high integration capability, design flexibility, and mass productivity. In this paper, recent investigations of the micro gating devices using electron-beam lithography are described, with emphasis on clarifying both their uses and fundamental optical characteristics.

Citation Download Citation

Tsukasa Yamashita and Shigeru Aoyama "Micrograting device using electron-beam lithography", Proc. SPIE 1507, Holographic Optics III: Principles and Applications, (1 September 1991); https://doi.org/10.1117/12.47030

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