Ta/Al alloy thin film medium-power attenuator

Bangchao Yang; Yu Ming Jia

doi:10.1117/12.47252

1 November 1991 Ta/Al alloy thin film medium-power attenuator

Bangchao Yang, Yu Ming Jia

Proceedings Volume 1519, International Conference on Thin Film Physics and Applications; (1991) https://doi.org/10.1117/12.47252
Event: International Conference on Thin Film Physics and Applications, 1991, Shanghai, China

Abstract

Ta/Al alloy resistive thin film has become more and more attractive in manufacture of the high-accurate and high-stable thin-film power resistance and its network due to its excellent thermal stability since the 1970s. In this paper, both Ta/Al alloy resistive film containing Al 50 at.% and the medium-power thin-film attenuator used for microwave circuit are studied and analyzed.

Citation Download Citation

Bangchao Yang and Yu Ming Jia "Ta/Al alloy thin film medium-power attenuator", Proc. SPIE 1519, International Conference on Thin Film Physics and Applications, (1 November 1991); https://doi.org/10.1117/12.47252

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