Computer-aided optimal design of phase-shifting masks

Chih-Yuan Chang; Charles D. Schaper; Thomas Kailath

doi:10.1117/12.130310

1 June 1992 Computer-aided optimal design of phase-shifting masks

Chih-Yuan Chang, Charles D. Schaper, Thomas Kailath

Proceedings Volume 1674, Optical/Laser Microlithography V; (1992) https://doi.org/10.1117/12.130310
Event: Microlithography '92, 1992, San Jose, CA, United States

Abstract

Phase-shifting masks are expected to improve the resolution of photolithography without renovation of exposure systems. However, the problem of finding an effective method for designing phase-shifting masks for arbitrary IC patterns has been open for several years. We propose here a computational strategy to solve this problem. The computational complexity of the proposed technique is 0(N3), where N is the total number of pixels on the image plane. Simulation results show that with optimally designed phase-shifting masks, 0.45?/NA contact hole, 0.45?/NA single space, and 0.30?/NA periodic lines/spaces may be printed.

Citation Download Citation

Chih-Yuan Chang, Charles D. Schaper, and Thomas Kailath "Computer-aided optimal design of phase-shifting masks", Proc. SPIE 1674, Optical/Laser Microlithography V, (1 June 1992); https://doi.org/10.1117/12.130310

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