Some oxide films deposited by reactive low-voltage plasma-assisted evaporation

Xu Liu; Bin Wang; Gan Wang; Peifu Gu; Jinfa Tang

doi:10.1117/12.163657

25 November 1993 Some oxide films deposited by reactive low-voltage plasma-assisted evaporation

Xu Liu, Bin Wang, Gan Wang, Peifu Gu, Jinfa Tang

Proceedings Volume 2000, Current Developments in Optical Design and Optical Engineering III; (1993) https://doi.org/10.1117/12.163657
Event: SPIE's 1993 International Symposium on Optics, Imaging, and Instrumentation, 1993, San Diego, CA, United States

Abstract

Low voltage plasma assisted evaporation (PAE) technique has been investigated as an effective evaporation technique for the deposition of oxide films of high optical performance. The PAE process consists of an electron beam evaporator and a large current plasma source. The guided wave method is used to measure the refractive index and attenuation coefficients of guided modes of some oxide films deposited by PEA. The experimental systems and results are presented.

Citation Download Citation

Xu Liu, Bin Wang, Gan Wang, Peifu Gu, and Jinfa Tang "Some oxide films deposited by reactive low-voltage plasma-assisted evaporation", Proc. SPIE 2000, Current Developments in Optical Design and Optical Engineering III, (25 November 1993); https://doi.org/10.1117/12.163657

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available