Precision alignment of the advanced light source U5.0 and U8.0 undulators

David E. Humphries; John Chin; Raymond F. Connors; J. Cummings; T. Keffler; W. Gath; Egon H. Hoyer; Brian M. Kincaid; P. Pipersky

doi:10.1117/12.164789

29 November 1993 Precision alignment of the advanced light source U5.0 and U8.0 undulators

David E. Humphries, John Chin, Raymond F. Connors, J. Cummings, T. Keffler, W. Gath, Egon H. Hoyer, Brian M. Kincaid, P. Pipersky

Author Affiliations +

Proceedings Volume 2013, Electron-Beam Sources of High-Brightness Radiation; (1993) https://doi.org/10.1117/12.164789
Event: SPIE's 1993 International Symposium on Optics, Imaging, and Instrumentation, 1993, San Diego, CA, United States

Abstract

The U5.0 and U8.0 undulators for the Advanced Light Source incorporate 4.6-m-long, hybrid- configuration magnetic structures. The structures consist of modules with half-period pole assemblies mounted on 0.8-m-long aluminum mounts, which are in turn attached to continuous steel backing beams. The vertical and longitudinal alignment tolerances for the poles of these structures are 25 microns and 50 microns, respectively, over the entire 4.6-m length of the devices. To meet these tolerances, the modules were first aligned individually using an automated coordinate measurement machine and shimming techniques. Several adjustment iterations were required for each module. Averaging and 3D linear least-squares fitting techniques were employed to establish statistically based error reference planes. Graphical spread sheets were used to create representations of vertical and longitudinal pole position errors for alignment.

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David E. Humphries, John Chin, Raymond F. Connors, J. Cummings, T. Keffler, W. Gath, Egon H. Hoyer, Brian M. Kincaid, and P. Pipersky "Precision alignment of the advanced light source U5.0 and U8.0 undulators", Proc. SPIE 2013, Electron-Beam Sources of High-Brightness Radiation, (29 November 1993); https://doi.org/10.1117/12.164789

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