Paper
30 September 1996 Green photoluminescence from nc-Ge particles
Peiyi Chen, Huaizhe Xu, Meifang Zhu, Boyuan Hou
Author Affiliations +
Proceedings Volume 2892, Display Devices and Systems; (1996) https://doi.org/10.1117/12.253340
Event: Photonics China '96, 1996, Beijing, China
Abstract
Nanocrystalline Ge particles embedded in glassy SiO2 matrix were prepared by rf cosputtering technique and the followed thermal annealing at 600 degree(s)C. Multiple-peak structure around 2.26 ev in photoluminescence spectrum of annealed sample was observed at room temperature, and variation of PL with excitation wavelengths in a range from 457.9 nm to 514.5 nm has been systematically measured and investigated. Raman scattering and X-ray photoelectron spectroscopy measurements strongly suggested existence of Ge nanocrystalline particulates in the SiO2 matrices. The size of nc-Ge is dependent on thermal treatment condition. A preliminary discussion about the origin of such visible photoluminescence phenomenon is presented.
© (1996) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Peiyi Chen, Huaizhe Xu, Meifang Zhu, and Boyuan Hou "Green photoluminescence from nc-Ge particles", Proc. SPIE 2892, Display Devices and Systems, (30 September 1996); https://doi.org/10.1117/12.253340
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KEYWORDS
Germanium

Luminescence

Raman spectroscopy

Annealing

Nanocrystals

Particles

Silicon

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