Paper
13 June 1997 Magnetomechanical properties of Terfenol-D thin films
Quanmin Su, Modher Cherif, J. Morillo, Yting Wen, Cecile Bailly, Manfred R. Wuttig
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Abstract
The magneto-mechanical properties of Terfenol-D thin films deposited on Si substrates were studied by magnetic and mechanical measurements of film/substrate cantilevers. The (Delta) E effect and mechanical damping of the film were measured simultaneously. The stress in the film was controlled by annealing and deposition at different temperatures as well by the selection of the substrate material below the recrystallization temperature and determined to vary from -500 MPa, compression, in as deposited films to +480 MPa, tension, in annealed films. This paper highlights the magneto-mechanical response of tensioned 1 micrometers nanocrystalline Terfenol-D films on 50 $mUm Si substrates display a pronounced damping maximum at a magnetic field of about 1.5kOe oriented perpendicular to the plane of the film. The phenomenon is critically dependent on the orientation of the magnetic field and is the result of a magneto-mechanical instability in the Terfenol film.
© (1997) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Quanmin Su, Modher Cherif, J. Morillo, Yting Wen, Cecile Bailly, and Manfred R. Wuttig "Magnetomechanical properties of Terfenol-D thin films", Proc. SPIE 3039, Smart Structures and Materials 1997: Mathematics and Control in Smart Structures, (13 June 1997); https://doi.org/10.1117/12.276542
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KEYWORDS
Magnetism

Silicon

Composites

Thin films

Magnetostrictive materials

Annealing

Oscillators

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